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Effects of Varied Cleaning Methods on Ni-5% W Substrate for Dip-Coating of Water-based Buffer Layers: An X-ray Photoelectron Spectroscopy Study

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ABSTRACT

This work describes various combinations of cleaning methods involved in the preparation of Ni-5% W substrates for the deposition of buffer layers using water-based solvents. The substrate has been studied for its surface properties using X-ray photoelectron spectroscopy (XPS). The contaminants in the substrates have been quantified and the appropriate cleaning method was chosen in terms of contaminants level and showing good surface crystallinity to further consider them for depositing chemical solution-based buffer layers for Y1Ba2Cu3Oy (YBCO) coated conductors.

No MeSH data available.


XPS depth profile studies of Ni-5% W substrate chemically cleaned with etching for 15 min.
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nanomaterials-02-00251-f004: XPS depth profile studies of Ni-5% W substrate chemically cleaned with etching for 15 min.

Mentions: The as-received substrates were chemically cleaned and etched for 15 min. Figure 4 depicts the various percentages of elements present in this sample after different sputter cycles, starting from the top-surface. On the surface of the sample a relatively high amount of oxygen was observed. This can be attributed to the use of the HCOOH-H2O2 mixture which releases active oxygen species that can attach to the surface of the sample.


Effects of Varied Cleaning Methods on Ni-5% W Substrate for Dip-Coating of Water-based Buffer Layers: An X-ray Photoelectron Spectroscopy Study
XPS depth profile studies of Ni-5% W substrate chemically cleaned with etching for 15 min.
© Copyright Policy
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC5304587&req=5

nanomaterials-02-00251-f004: XPS depth profile studies of Ni-5% W substrate chemically cleaned with etching for 15 min.
Mentions: The as-received substrates were chemically cleaned and etched for 15 min. Figure 4 depicts the various percentages of elements present in this sample after different sputter cycles, starting from the top-surface. On the surface of the sample a relatively high amount of oxygen was observed. This can be attributed to the use of the HCOOH-H2O2 mixture which releases active oxygen species that can attach to the surface of the sample.

View Article: PubMed Central - PubMed

ABSTRACT

This work describes various combinations of cleaning methods involved in the preparation of Ni-5% W substrates for the deposition of buffer layers using water-based solvents. The substrate has been studied for its surface properties using X-ray photoelectron spectroscopy (XPS). The contaminants in the substrates have been quantified and the appropriate cleaning method was chosen in terms of contaminants level and showing good surface crystallinity to further consider them for depositing chemical solution-based buffer layers for Y1Ba2Cu3Oy (YBCO) coated conductors.

No MeSH data available.