Limits...
Patterned transparent electrode with a continuous distribution of silver nanowires produced by an etching-free patterning method

View Article: PubMed Central - PubMed

ABSTRACT

The outstanding electrical, optical, and mechanical properties of silver nanowire transparent electrodes are attractive for use in many optoelectronic devices, and the recent developments related to these electrodes have led to their commercialization. To more fully utilize the advantages of this technology, developing new process technologies in addition to performance improvements is important. In this report, we propose a novel ultra-simple patterning technology to generate a silver nanowire transparent layer and a unique patterned structure with continuously distributed silver nanowires without any etched areas. The patterning is conducted by exposure to ultraviolet light and rinsing. The exposed and unexposed regions of the resulting layer have dramatically different electrical conductivities, which produces an electrical pathway without using any etching or lift-off processes. The unique patterned structure produced by this etching-free method creates hardly any optical difference between the two regions and results in excellent visibility of the patterned transparent electrode layer.

No MeSH data available.


Related in: MedlinePlus

(a) The preparation procedure for the patterned transparent electrode layer with a continuous distribution of AgNWs. (b) The dependence of the UV absorbance on the exposure dose. (c) The confocal microscopy image of the patterned layer. (d,e) The SEM images of the unexposed and exposed regions in the patterned layer, respectively. The inset of each image is a magnification.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
getmorefigures.php?uid=PMC5304198&req=5

f1: (a) The preparation procedure for the patterned transparent electrode layer with a continuous distribution of AgNWs. (b) The dependence of the UV absorbance on the exposure dose. (c) The confocal microscopy image of the patterned layer. (d,e) The SEM images of the unexposed and exposed regions in the patterned layer, respectively. The inset of each image is a magnification.

Mentions: The procedure for patterning the photosensitive AgNW composite layer is shown in Fig. 1(a). The composite coating solution was prepared by combining AgNW, hydroxypropyl methylcellulose (HPMC), polyethylenimine (PEI), ethylene glycol, and poly(vinyl alcohol), N-methyl-4(4′-formylstyryl) pyridinium methosulfate acetal (sbq-PVA). The prepared coating solution was homogeneously coated on polyethylene terephthalate (PET) substrates via the bar-coating method. The coated substrate was baked at 110 °C in a convection oven for 10 minutes. Finally, the composite film was exposed to UV light and rinsed with water (see Video File 1 in the supporting information).


Patterned transparent electrode with a continuous distribution of silver nanowires produced by an etching-free patterning method
(a) The preparation procedure for the patterned transparent electrode layer with a continuous distribution of AgNWs. (b) The dependence of the UV absorbance on the exposure dose. (c) The confocal microscopy image of the patterned layer. (d,e) The SEM images of the unexposed and exposed regions in the patterned layer, respectively. The inset of each image is a magnification.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC5304198&req=5

f1: (a) The preparation procedure for the patterned transparent electrode layer with a continuous distribution of AgNWs. (b) The dependence of the UV absorbance on the exposure dose. (c) The confocal microscopy image of the patterned layer. (d,e) The SEM images of the unexposed and exposed regions in the patterned layer, respectively. The inset of each image is a magnification.
Mentions: The procedure for patterning the photosensitive AgNW composite layer is shown in Fig. 1(a). The composite coating solution was prepared by combining AgNW, hydroxypropyl methylcellulose (HPMC), polyethylenimine (PEI), ethylene glycol, and poly(vinyl alcohol), N-methyl-4(4′-formylstyryl) pyridinium methosulfate acetal (sbq-PVA). The prepared coating solution was homogeneously coated on polyethylene terephthalate (PET) substrates via the bar-coating method. The coated substrate was baked at 110 °C in a convection oven for 10 minutes. Finally, the composite film was exposed to UV light and rinsed with water (see Video File 1 in the supporting information).

View Article: PubMed Central - PubMed

ABSTRACT

The outstanding electrical, optical, and mechanical properties of silver nanowire transparent electrodes are attractive for use in many optoelectronic devices, and the recent developments related to these electrodes have led to their commercialization. To more fully utilize the advantages of this technology, developing new process technologies in addition to performance improvements is important. In this report, we propose a novel ultra-simple patterning technology to generate a silver nanowire transparent layer and a unique patterned structure with continuously distributed silver nanowires without any etched areas. The patterning is conducted by exposure to ultraviolet light and rinsing. The exposed and unexposed regions of the resulting layer have dramatically different electrical conductivities, which produces an electrical pathway without using any etching or lift-off processes. The unique patterned structure produced by this etching-free method creates hardly any optical difference between the two regions and results in excellent visibility of the patterned transparent electrode layer.

No MeSH data available.


Related in: MedlinePlus