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Energy dispersive x-ray spectroscopy for nanostructured thin film density evaluation

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ABSTRACT

In this paper, we report on two fast and non-destructive methods for nanostructured film density evaluation based on a combination of energy dispersive x-ray spectroscopy for areal density measurement and scanning electron microscopy (SEM) for thickness evaluation. These techniques have been applied to films with density ranging from the density of a solid down to a few , with different compositions and morphologies. The high resolution of an electron microprobe has been exploited to characterize non-uniform films both at the macroscopic scale and at the microscopic scale.

No MeSH data available.


Density of thin tungsten films as a function of gas pressure in the deposition chamber.
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Figure 3: Density of thin tungsten films as a function of gas pressure in the deposition chamber.

Mentions: The method comparison was further investigated through experiments performed on amorphous-like tungsten films deposited by PLD on Si substrates [19]. In this case, the selection of silicon as substrate material is critical: since the Si and the W peaks strongly overlap, the accuracy of the substrate method could be non-optimal. In addition, the intensity of the Si Kα peak can be affected by fluorescence effects due to W Lα emission in the coating. Results are reported in figure 3. The deviation of measured values from reference density values evaluated by QCM is around 5% for the coating method, much lower than the difference observed for the substrate method, which in some cases is above 30%. Thus, only the coating method results for the W peak will be discussed in section 4.2.


Energy dispersive x-ray spectroscopy for nanostructured thin film density evaluation
Density of thin tungsten films as a function of gas pressure in the deposition chamber.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC5036461&req=5

Figure 3: Density of thin tungsten films as a function of gas pressure in the deposition chamber.
Mentions: The method comparison was further investigated through experiments performed on amorphous-like tungsten films deposited by PLD on Si substrates [19]. In this case, the selection of silicon as substrate material is critical: since the Si and the W peaks strongly overlap, the accuracy of the substrate method could be non-optimal. In addition, the intensity of the Si Kα peak can be affected by fluorescence effects due to W Lα emission in the coating. Results are reported in figure 3. The deviation of measured values from reference density values evaluated by QCM is around 5% for the coating method, much lower than the difference observed for the substrate method, which in some cases is above 30%. Thus, only the coating method results for the W peak will be discussed in section 4.2.

View Article: PubMed Central - PubMed

ABSTRACT

In this paper, we report on two fast and non-destructive methods for nanostructured film density evaluation based on a combination of energy dispersive x-ray spectroscopy for areal density measurement and scanning electron microscopy (SEM) for thickness evaluation. These techniques have been applied to films with density ranging from the density of a solid down to a few , with different compositions and morphologies. The high resolution of an electron microprobe has been exploited to characterize non-uniform films both at the macroscopic scale and at the microscopic scale.

No MeSH data available.