Limits...
Energy dispersive x-ray spectroscopy for nanostructured thin film density evaluation

View Article: PubMed Central - PubMed

ABSTRACT

In this paper, we report on two fast and non-destructive methods for nanostructured film density evaluation based on a combination of energy dispersive x-ray spectroscopy for areal density measurement and scanning electron microscopy (SEM) for thickness evaluation. These techniques have been applied to films with density ranging from the density of a solid down to a few , with different compositions and morphologies. The high resolution of an electron microprobe has been exploited to characterize non-uniform films both at the macroscopic scale and at the microscopic scale.

No MeSH data available.


Areal density of a thin Ag film on Au substrate measured as a function of the electron accelerating voltage.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
getmorefigures.php?uid=PMC5036461&req=5

Figure 2: Areal density of a thin Ag film on Au substrate measured as a function of the electron accelerating voltage.

Mentions: The coating method and the substrate method were employed to characterize the Ag film in a wide electron accelerating voltage range (8–29 kV). From the results reported in figure 2, it is evident that for both methods, an optimal range for the electron accelerating voltage exists in which the areal density values are less affected by voltage variations. For the coating method a voltage higher than 19 kV is required, while the substrate method provides stable results above 13 kV. The maximum acceptable voltage could not be determined, as it is higher than the maximum value achievable with our instruments. The results reported in figure 2 allow us to compare the accuracy of the two methods. In the optimum voltage range, the deviation from QCM-measured areal density is around 10% and 25%, respectively. Thus, in this case, the substrate method is more accurate than the coating method.


Energy dispersive x-ray spectroscopy for nanostructured thin film density evaluation
Areal density of a thin Ag film on Au substrate measured as a function of the electron accelerating voltage.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC5036461&req=5

Figure 2: Areal density of a thin Ag film on Au substrate measured as a function of the electron accelerating voltage.
Mentions: The coating method and the substrate method were employed to characterize the Ag film in a wide electron accelerating voltage range (8–29 kV). From the results reported in figure 2, it is evident that for both methods, an optimal range for the electron accelerating voltage exists in which the areal density values are less affected by voltage variations. For the coating method a voltage higher than 19 kV is required, while the substrate method provides stable results above 13 kV. The maximum acceptable voltage could not be determined, as it is higher than the maximum value achievable with our instruments. The results reported in figure 2 allow us to compare the accuracy of the two methods. In the optimum voltage range, the deviation from QCM-measured areal density is around 10% and 25%, respectively. Thus, in this case, the substrate method is more accurate than the coating method.

View Article: PubMed Central - PubMed

ABSTRACT

In this paper, we report on two fast and non-destructive methods for nanostructured film density evaluation based on a combination of energy dispersive x-ray spectroscopy for areal density measurement and scanning electron microscopy (SEM) for thickness evaluation. These techniques have been applied to films with density ranging from the density of a solid down to a few , with different compositions and morphologies. The high resolution of an electron microprobe has been exploited to characterize non-uniform films both at the macroscopic scale and at the microscopic scale.

No MeSH data available.