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Energy dispersive x-ray spectroscopy for nanostructured thin film density evaluation

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ABSTRACT

In this paper, we report on two fast and non-destructive methods for nanostructured film density evaluation based on a combination of energy dispersive x-ray spectroscopy for areal density measurement and scanning electron microscopy (SEM) for thickness evaluation. These techniques have been applied to films with density ranging from the density of a solid down to a few , with different compositions and morphologies. The high resolution of an electron microprobe has been exploited to characterize non-uniform films both at the macroscopic scale and at the microscopic scale.

No MeSH data available.


EDS-based film thickness measurement methods. a) X-ray emission from a coating with thickness t and from a substrate due to the incident electron beam. b) X-ray emission from reference standards for the coating method and the substrate method.
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Figure 1: EDS-based film thickness measurement methods. a) X-ray emission from a coating with thickness t and from a substrate due to the incident electron beam. b) X-ray emission from reference standards for the coating method and the substrate method.

Mentions: These approaches, respectively known as the coating method and the substrate method, were developed for multilayer samples composed of a known substrate and a coating with unknown thickness. In these methods, the coating layer thickness is calculated from the intensity of x-rays produced either in the sample coating or substrate by an incoming electron beam with appropriate initial energy, provided that the intensity of the x-rays produced by a bulk reference standard is known (see figure 1). The main difference between the coating method and the substrate method lies in the choice of the reference standard: the reference standard must contain an emitting element present only in the sample coating or in the substrate, respectively.


Energy dispersive x-ray spectroscopy for nanostructured thin film density evaluation
EDS-based film thickness measurement methods. a) X-ray emission from a coating with thickness t and from a substrate due to the incident electron beam. b) X-ray emission from reference standards for the coating method and the substrate method.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC5036461&req=5

Figure 1: EDS-based film thickness measurement methods. a) X-ray emission from a coating with thickness t and from a substrate due to the incident electron beam. b) X-ray emission from reference standards for the coating method and the substrate method.
Mentions: These approaches, respectively known as the coating method and the substrate method, were developed for multilayer samples composed of a known substrate and a coating with unknown thickness. In these methods, the coating layer thickness is calculated from the intensity of x-rays produced either in the sample coating or substrate by an incoming electron beam with appropriate initial energy, provided that the intensity of the x-rays produced by a bulk reference standard is known (see figure 1). The main difference between the coating method and the substrate method lies in the choice of the reference standard: the reference standard must contain an emitting element present only in the sample coating or in the substrate, respectively.

View Article: PubMed Central - PubMed

ABSTRACT

In this paper, we report on two fast and non-destructive methods for nanostructured film density evaluation based on a combination of energy dispersive x-ray spectroscopy for areal density measurement and scanning electron microscopy (SEM) for thickness evaluation. These techniques have been applied to films with density ranging from the density of a solid down to a few , with different compositions and morphologies. The high resolution of an electron microprobe has been exploited to characterize non-uniform films both at the macroscopic scale and at the microscopic scale.

No MeSH data available.