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Highly conductive and pure gold nanostructures grown by electron beam induced deposition

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ABSTRACT

This work introduces an additive direct-write nanofabrication technique for producing extremely conductive gold nanostructures from a commercial metalorganic precursor. Gold content of 91 atomic % (at. %) was achieved by using water as an oxidative enhancer during direct-write deposition. A model was developed based on the deposition rate and the chemical composition, and it explains the surface processes that lead to the increases in gold purity and deposition yield. Co-injection of an oxidative enhancer enabled Focused Electron Beam Induced Deposition (FEBID)—a maskless, resistless deposition method for three dimensional (3D) nanostructures—to directly yield pure gold in a single process step, without post-deposition purification. Gold nanowires displayed resistivity down to 8.8 μΩ cm. This is the highest conductivity achieved so far from FEBID and it opens the possibility of applications in nanoelectronics, such as direct-write contacts to nanomaterials. The increased gold deposition yield and the ultralow carbon level will facilitate future applications such as the fabrication of 3D nanostructures in nanoplasmonics and biomolecule immobilization.

No MeSH data available.


Specially enhanced FEBID process.(a) Conventional FEBID Au process (b) Water-assisted FEBID Au process (c) Conventional FEBID Au structure, (d) Water-assisted FEBID Au, (e) Atomic composition obtained from SEM EDX for different chamber pressures.
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f1: Specially enhanced FEBID process.(a) Conventional FEBID Au process (b) Water-assisted FEBID Au process (c) Conventional FEBID Au structure, (d) Water-assisted FEBID Au, (e) Atomic composition obtained from SEM EDX for different chamber pressures.

Mentions: In a typical FEBID process shown in Fig. 1a, there are two major factors that result in low metal content of the deposit: i) carbon deposition from the residual gas in the SEM chamber and ii) carbon originating from the ligands of metalorganic precursors. To reduce the contribution of carbon deposition from residual gas inside the SEM, the chamber was cleaned prior to deposition utilizing highly energetic ultraviolet light combined with highly reactive ozone44.


Highly conductive and pure gold nanostructures grown by electron beam induced deposition
Specially enhanced FEBID process.(a) Conventional FEBID Au process (b) Water-assisted FEBID Au process (c) Conventional FEBID Au structure, (d) Water-assisted FEBID Au, (e) Atomic composition obtained from SEM EDX for different chamber pressures.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC5035929&req=5

f1: Specially enhanced FEBID process.(a) Conventional FEBID Au process (b) Water-assisted FEBID Au process (c) Conventional FEBID Au structure, (d) Water-assisted FEBID Au, (e) Atomic composition obtained from SEM EDX for different chamber pressures.
Mentions: In a typical FEBID process shown in Fig. 1a, there are two major factors that result in low metal content of the deposit: i) carbon deposition from the residual gas in the SEM chamber and ii) carbon originating from the ligands of metalorganic precursors. To reduce the contribution of carbon deposition from residual gas inside the SEM, the chamber was cleaned prior to deposition utilizing highly energetic ultraviolet light combined with highly reactive ozone44.

View Article: PubMed Central - PubMed

ABSTRACT

This work introduces an additive direct-write nanofabrication technique for producing extremely conductive gold nanostructures from a commercial metalorganic precursor. Gold content of 91 atomic % (at. %) was achieved by using water as an oxidative enhancer during direct-write deposition. A model was developed based on the deposition rate and the chemical composition, and it explains the surface processes that lead to the increases in gold purity and deposition yield. Co-injection of an oxidative enhancer enabled Focused Electron Beam Induced Deposition (FEBID)—a maskless, resistless deposition method for three dimensional (3D) nanostructures—to directly yield pure gold in a single process step, without post-deposition purification. Gold nanowires displayed resistivity down to 8.8 μΩ cm. This is the highest conductivity achieved so far from FEBID and it opens the possibility of applications in nanoelectronics, such as direct-write contacts to nanomaterials. The increased gold deposition yield and the ultralow carbon level will facilitate future applications such as the fabrication of 3D nanostructures in nanoplasmonics and biomolecule immobilization.

No MeSH data available.