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Flexible Field Emitter for X-ray Generation by Implanting CNTs into Nickel Foil.

Sun B, Wang Y, Ding G - Nanoscale Res Lett (2016)

Bottom Line: By embedding CNT roots into Ni foil using polymer matrix as transfer media, effective direct contact between Ni and CNTs was achieved.As a result, our novel emitter shows relatively good field emission properties such as low turn-on field and good stability.The gray shadow that appears on the sensitive film after being exposed to the radiation confirms the successful generation of X-ray.

View Article: PubMed Central - PubMed

Affiliation: National Key Laboratory of Micro/Nano Fabrication Technology, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai, 200240, People's Republic of China.

ABSTRACT
This paper reports a novel implanting micromachining technology. By using this method, for the first time, we could implant nano-scale materials into milli-scale metal substrates at room temperature. Ni-based flexible carbon nanotube (CNT) field emitters were fabricated by the novel micromachining method. By embedding CNT roots into Ni foil using polymer matrix as transfer media, effective direct contact between Ni and CNTs was achieved. As a result, our novel emitter shows relatively good field emission properties such as low turn-on field and good stability. Moreover, the emitter was highly flexible with preservation of the field emission properties. The excellent field emission characteristics attributed to the direct contact and the strong interactions between CNTs and the substrate. To check the practical application of the novel emitter, a simple X-ray imaging system was set up by modifying a traditional tube. The gray shadow that appears on the sensitive film after being exposed to the radiation confirms the successful generation of X-ray.

No MeSH data available.


SEM images of the CNT/PI film etched for different times a 60, b 120, c 240, and d 480 s. SEM images of the fabricated emitter etched for different times e 60, f 120, g 240, and h 480 s
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Fig4: SEM images of the CNT/PI film etched for different times a 60, b 120, c 240, and d 480 s. SEM images of the fabricated emitter etched for different times e 60, f 120, g 240, and h 480 s

Mentions: Selective wet etching played an important role in this implanting method. The CNT/PI film surface morphology after etching for 60, 120, 240, and 480 s is shown in Fig. 4a–d. With the etching time increased, PI was etched away, and more and longer CNTs exposed from the surface (the “root” means of the CNTs exposed from the PI surface after wet etching). As a result, the surface morphology of the fabricated emitter differed from one another (as shown in Fig. 4e–h). For the samples etched for 60 and 120 s, only a small amount of nanotubes exposed from the surface after the wet etching, resulting in a few of nanotubes being implanted into the Ni foil. As the short “root” buried in the Ni foil could hardly bear the strain of the whole tube weight, it was easily dropped out during the fabrication, resulting in a trail left on the foil (as shown in Fig. 4e, f). For the samples etched for too much time, large amounts of nanotubes could be achieved. However, the long “root” was easily twisted and buried in the Ni foil, resulting in short CNTs exposed on the foil (as shown in Fig. 4h). As we know, the vertical alignment and uniform distribution of the CNTs in the Ni substrate actively contributed to stable electron emission when an electric field is applied, and we carefully controlled the distribution and height of CNTs exposed on the foil by the wet etching process.Fig. 4


Flexible Field Emitter for X-ray Generation by Implanting CNTs into Nickel Foil.

Sun B, Wang Y, Ding G - Nanoscale Res Lett (2016)

SEM images of the CNT/PI film etched for different times a 60, b 120, c 240, and d 480 s. SEM images of the fabricated emitter etched for different times e 60, f 120, g 240, and h 480 s
© Copyright Policy - OpenAccess
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC4940312&req=5

Fig4: SEM images of the CNT/PI film etched for different times a 60, b 120, c 240, and d 480 s. SEM images of the fabricated emitter etched for different times e 60, f 120, g 240, and h 480 s
Mentions: Selective wet etching played an important role in this implanting method. The CNT/PI film surface morphology after etching for 60, 120, 240, and 480 s is shown in Fig. 4a–d. With the etching time increased, PI was etched away, and more and longer CNTs exposed from the surface (the “root” means of the CNTs exposed from the PI surface after wet etching). As a result, the surface morphology of the fabricated emitter differed from one another (as shown in Fig. 4e–h). For the samples etched for 60 and 120 s, only a small amount of nanotubes exposed from the surface after the wet etching, resulting in a few of nanotubes being implanted into the Ni foil. As the short “root” buried in the Ni foil could hardly bear the strain of the whole tube weight, it was easily dropped out during the fabrication, resulting in a trail left on the foil (as shown in Fig. 4e, f). For the samples etched for too much time, large amounts of nanotubes could be achieved. However, the long “root” was easily twisted and buried in the Ni foil, resulting in short CNTs exposed on the foil (as shown in Fig. 4h). As we know, the vertical alignment and uniform distribution of the CNTs in the Ni substrate actively contributed to stable electron emission when an electric field is applied, and we carefully controlled the distribution and height of CNTs exposed on the foil by the wet etching process.Fig. 4

Bottom Line: By embedding CNT roots into Ni foil using polymer matrix as transfer media, effective direct contact between Ni and CNTs was achieved.As a result, our novel emitter shows relatively good field emission properties such as low turn-on field and good stability.The gray shadow that appears on the sensitive film after being exposed to the radiation confirms the successful generation of X-ray.

View Article: PubMed Central - PubMed

Affiliation: National Key Laboratory of Micro/Nano Fabrication Technology, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai, 200240, People's Republic of China.

ABSTRACT
This paper reports a novel implanting micromachining technology. By using this method, for the first time, we could implant nano-scale materials into milli-scale metal substrates at room temperature. Ni-based flexible carbon nanotube (CNT) field emitters were fabricated by the novel micromachining method. By embedding CNT roots into Ni foil using polymer matrix as transfer media, effective direct contact between Ni and CNTs was achieved. As a result, our novel emitter shows relatively good field emission properties such as low turn-on field and good stability. Moreover, the emitter was highly flexible with preservation of the field emission properties. The excellent field emission characteristics attributed to the direct contact and the strong interactions between CNTs and the substrate. To check the practical application of the novel emitter, a simple X-ray imaging system was set up by modifying a traditional tube. The gray shadow that appears on the sensitive film after being exposed to the radiation confirms the successful generation of X-ray.

No MeSH data available.