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Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching.

Ye X, Jiang X, Huang J, Geng F, Sun L, Zu X, Wu W, Zheng W - Sci Rep (2015)

Bottom Line: The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method.This method is also applicable to diffraction grating fabrication.Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties.

View Article: PubMed Central - PubMed

Affiliation: Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900 (P.R. China).

ABSTRACT
Fused silica subwavelength structures (SWSs) with an average period of ~100 nm were fabricated using an efficient approach based on one-step self-masking reactive ion etching. The subwavelength structures exhibited excellent broadband antireflection properties from the ultraviolet to near-infrared wavelength range. These properties are attributable to the graded refractive index for the transition from air to the fused silica substrate that is produced by the ideal nanocone subwavelength structures. The transmittance in the 400-700 nm range increased from approximately 93% for the polished fused silica to greater than 99% for the subwavelength structure layer on fused silica. Achieving broadband antireflection in the visible and near-infrared wavelength range by appropriate matching of the SWS heights on the front and back sides of the fused silica is a novel strategy. The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method. This method is also applicable to diffraction grating fabrication. Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties.

No MeSH data available.


Superhydrophilic SWS surfaces on the fused silica substrate.(A) Water drop profile on a bare fused silica substrate. (B–D) Water drop profile on an SWS surface. (E) Comparison of fogging on the superhydrophilic SWS area (top) and the bare area (bottom). (F) The large scale anti-fogging SWS fused silica (right) and the bare fused silica (left). Figures (E,F) were obtained by X. Ye and L. Sun.
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f7: Superhydrophilic SWS surfaces on the fused silica substrate.(A) Water drop profile on a bare fused silica substrate. (B–D) Water drop profile on an SWS surface. (E) Comparison of fogging on the superhydrophilic SWS area (top) and the bare area (bottom). (F) The large scale anti-fogging SWS fused silica (right) and the bare fused silica (left). Figures (E,F) were obtained by X. Ye and L. Sun.

Mentions: The fused silica SWSs significantly enhanced the surface hydrophilicity by inducing surface roughness on the hydrophilic fused silica substrate. The wettability of the covered SWSs and bare fused silica substrate surfaces was characterized via the water contact angle measurement method using a 3-μL water droplet at room temperature. Figure 7(A–D) shows the water droplet profile of the bare fused silica substrate and the fabricated fused silica SWS surfaces. The measured apparent water contact angle was ca. 25° for the bare fused silica substrate (Fig. 7A). When the water droplet contacted the fused silica SWS surface, it completely covered the surface within 0.14 s, and the apparent contact angle was ~0°. These results suggest that a superhydrophilic surface was achieved (Fig. 7B–D).


Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching.

Ye X, Jiang X, Huang J, Geng F, Sun L, Zu X, Wu W, Zheng W - Sci Rep (2015)

Superhydrophilic SWS surfaces on the fused silica substrate.(A) Water drop profile on a bare fused silica substrate. (B–D) Water drop profile on an SWS surface. (E) Comparison of fogging on the superhydrophilic SWS area (top) and the bare area (bottom). (F) The large scale anti-fogging SWS fused silica (right) and the bare fused silica (left). Figures (E,F) were obtained by X. Ye and L. Sun.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC4542686&req=5

f7: Superhydrophilic SWS surfaces on the fused silica substrate.(A) Water drop profile on a bare fused silica substrate. (B–D) Water drop profile on an SWS surface. (E) Comparison of fogging on the superhydrophilic SWS area (top) and the bare area (bottom). (F) The large scale anti-fogging SWS fused silica (right) and the bare fused silica (left). Figures (E,F) were obtained by X. Ye and L. Sun.
Mentions: The fused silica SWSs significantly enhanced the surface hydrophilicity by inducing surface roughness on the hydrophilic fused silica substrate. The wettability of the covered SWSs and bare fused silica substrate surfaces was characterized via the water contact angle measurement method using a 3-μL water droplet at room temperature. Figure 7(A–D) shows the water droplet profile of the bare fused silica substrate and the fabricated fused silica SWS surfaces. The measured apparent water contact angle was ca. 25° for the bare fused silica substrate (Fig. 7A). When the water droplet contacted the fused silica SWS surface, it completely covered the surface within 0.14 s, and the apparent contact angle was ~0°. These results suggest that a superhydrophilic surface was achieved (Fig. 7B–D).

Bottom Line: The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method.This method is also applicable to diffraction grating fabrication.Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties.

View Article: PubMed Central - PubMed

Affiliation: Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900 (P.R. China).

ABSTRACT
Fused silica subwavelength structures (SWSs) with an average period of ~100 nm were fabricated using an efficient approach based on one-step self-masking reactive ion etching. The subwavelength structures exhibited excellent broadband antireflection properties from the ultraviolet to near-infrared wavelength range. These properties are attributable to the graded refractive index for the transition from air to the fused silica substrate that is produced by the ideal nanocone subwavelength structures. The transmittance in the 400-700 nm range increased from approximately 93% for the polished fused silica to greater than 99% for the subwavelength structure layer on fused silica. Achieving broadband antireflection in the visible and near-infrared wavelength range by appropriate matching of the SWS heights on the front and back sides of the fused silica is a novel strategy. The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method. This method is also applicable to diffraction grating fabrication. Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties.

No MeSH data available.