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Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching.

Ye X, Jiang X, Huang J, Geng F, Sun L, Zu X, Wu W, Zheng W - Sci Rep (2015)

Bottom Line: The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method.This method is also applicable to diffraction grating fabrication.Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties.

View Article: PubMed Central - PubMed

Affiliation: Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900 (P.R. China).

ABSTRACT
Fused silica subwavelength structures (SWSs) with an average period of ~100 nm were fabricated using an efficient approach based on one-step self-masking reactive ion etching. The subwavelength structures exhibited excellent broadband antireflection properties from the ultraviolet to near-infrared wavelength range. These properties are attributable to the graded refractive index for the transition from air to the fused silica substrate that is produced by the ideal nanocone subwavelength structures. The transmittance in the 400-700 nm range increased from approximately 93% for the polished fused silica to greater than 99% for the subwavelength structure layer on fused silica. Achieving broadband antireflection in the visible and near-infrared wavelength range by appropriate matching of the SWS heights on the front and back sides of the fused silica is a novel strategy. The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method. This method is also applicable to diffraction grating fabrication. Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties.

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Related in: MedlinePlus

(A) Top view and (B) tilted view of the 3-μm-period grating that was coated with SWSs. The inset image is a schematic illustration of the fabricated SWS fused silica grating. (C) Measured transmission of the fabricated SWS fused silica grating at normal incidence.
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f6: (A) Top view and (B) tilted view of the 3-μm-period grating that was coated with SWSs. The inset image is a schematic illustration of the fabricated SWS fused silica grating. (C) Measured transmission of the fabricated SWS fused silica grating at normal incidence.

Mentions: To demonstrate the adaptability of this technology, we fabricated SWS on the grating surface with a period of 3 μm, a height of 200 nm and a duty cycle of 0.5. The surfaces of the ridges and grooves of each grating were covered with SWSs, as illustrated in Fig. 6(A,B). For the single-sided SWSs on the grating, the transmittance spectrum revealed a large improvement for the 300–1400 nm wavelength range, as shown in Fig. 6(C). High transmittance and diffraction efficiency were achieved due to the graded refractive index at the interface, which depended on the nanocone structure profile on the grating surface. The total reflectance of the fused silica grating was reduced from ~7.5% to ~4.5% (for the 550–700 nm wavelength range) due to the presence of SWSs on the grating surface (Figure S4). The reflected efficiencies of the 0th and ±1st diffracted orders for the fused silica grating with and without SWS were measured, as shown in Table S1. The reflected diffraction efficiencies were suppressed by the SWSs on the fused silica grating.


Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching.

Ye X, Jiang X, Huang J, Geng F, Sun L, Zu X, Wu W, Zheng W - Sci Rep (2015)

(A) Top view and (B) tilted view of the 3-μm-period grating that was coated with SWSs. The inset image is a schematic illustration of the fabricated SWS fused silica grating. (C) Measured transmission of the fabricated SWS fused silica grating at normal incidence.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC4542686&req=5

f6: (A) Top view and (B) tilted view of the 3-μm-period grating that was coated with SWSs. The inset image is a schematic illustration of the fabricated SWS fused silica grating. (C) Measured transmission of the fabricated SWS fused silica grating at normal incidence.
Mentions: To demonstrate the adaptability of this technology, we fabricated SWS on the grating surface with a period of 3 μm, a height of 200 nm and a duty cycle of 0.5. The surfaces of the ridges and grooves of each grating were covered with SWSs, as illustrated in Fig. 6(A,B). For the single-sided SWSs on the grating, the transmittance spectrum revealed a large improvement for the 300–1400 nm wavelength range, as shown in Fig. 6(C). High transmittance and diffraction efficiency were achieved due to the graded refractive index at the interface, which depended on the nanocone structure profile on the grating surface. The total reflectance of the fused silica grating was reduced from ~7.5% to ~4.5% (for the 550–700 nm wavelength range) due to the presence of SWSs on the grating surface (Figure S4). The reflected efficiencies of the 0th and ±1st diffracted orders for the fused silica grating with and without SWS were measured, as shown in Table S1. The reflected diffraction efficiencies were suppressed by the SWSs on the fused silica grating.

Bottom Line: The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method.This method is also applicable to diffraction grating fabrication.Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties.

View Article: PubMed Central - PubMed

Affiliation: Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900 (P.R. China).

ABSTRACT
Fused silica subwavelength structures (SWSs) with an average period of ~100 nm were fabricated using an efficient approach based on one-step self-masking reactive ion etching. The subwavelength structures exhibited excellent broadband antireflection properties from the ultraviolet to near-infrared wavelength range. These properties are attributable to the graded refractive index for the transition from air to the fused silica substrate that is produced by the ideal nanocone subwavelength structures. The transmittance in the 400-700 nm range increased from approximately 93% for the polished fused silica to greater than 99% for the subwavelength structure layer on fused silica. Achieving broadband antireflection in the visible and near-infrared wavelength range by appropriate matching of the SWS heights on the front and back sides of the fused silica is a novel strategy. The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method. This method is also applicable to diffraction grating fabrication. Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties.

No MeSH data available.


Related in: MedlinePlus