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Fine plastic foil as backing for sputtered nickel targets.

Stolarz A, Seppälä R - J Radioanal Nucl Chem (2013)

Bottom Line: Targets of (58)Ni and (60)Ni with areal density between 71 and 105 μg/cm(2) backed with polyimide foil of 35-40 μg/cm(2) were prepared by sputtering with Ar ions produced by a home made sputtering device at the Target Laboratory, University of Jyväskylä.The efficiency of the procedure was about 20 %.

View Article: PubMed Central - PubMed

Affiliation: Heavy Ion Laboratory, University of Warsaw, Ul. Pasteura 5a, 02-093 Warsaw, Poland.

ABSTRACT

Targets of (58)Ni and (60)Ni with areal density between 71 and 105 μg/cm(2) backed with polyimide foil of 35-40 μg/cm(2) were prepared by sputtering with Ar ions produced by a home made sputtering device at the Target Laboratory, University of Jyväskylä. The efficiency of the procedure was about 20 %.

No MeSH data available.


The heart of the sputterer; to the left is the graphite cathode with small cavity for the sputtered material; the rotating substrate holder is on the right
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Fig1: The heart of the sputterer; to the left is the graphite cathode with small cavity for the sputtered material; the rotating substrate holder is on the right

Mentions: A pellet of compressed Ni powder was placed in the cavity of the graphite cathode (Fig. 1). The backing substrates were fixed to the rotating substrate holder placed at the distance of 2.3 cm from the Ni pellet. The thickness of the deposits was controlled by the time of sputtering process. The final thickness of the deposit was estimated using the weighing method. The targets were produced with the deposition rate varying between 1.3 and 2.5 μg/cm2/min.Fig. 1


Fine plastic foil as backing for sputtered nickel targets.

Stolarz A, Seppälä R - J Radioanal Nucl Chem (2013)

The heart of the sputterer; to the left is the graphite cathode with small cavity for the sputtered material; the rotating substrate holder is on the right
© Copyright Policy - OpenAccess
Related In: Results  -  Collection

Show All Figures
getmorefigures.php?uid=PMC4514685&req=5

Fig1: The heart of the sputterer; to the left is the graphite cathode with small cavity for the sputtered material; the rotating substrate holder is on the right
Mentions: A pellet of compressed Ni powder was placed in the cavity of the graphite cathode (Fig. 1). The backing substrates were fixed to the rotating substrate holder placed at the distance of 2.3 cm from the Ni pellet. The thickness of the deposits was controlled by the time of sputtering process. The final thickness of the deposit was estimated using the weighing method. The targets were produced with the deposition rate varying between 1.3 and 2.5 μg/cm2/min.Fig. 1

Bottom Line: Targets of (58)Ni and (60)Ni with areal density between 71 and 105 μg/cm(2) backed with polyimide foil of 35-40 μg/cm(2) were prepared by sputtering with Ar ions produced by a home made sputtering device at the Target Laboratory, University of Jyväskylä.The efficiency of the procedure was about 20 %.

View Article: PubMed Central - PubMed

Affiliation: Heavy Ion Laboratory, University of Warsaw, Ul. Pasteura 5a, 02-093 Warsaw, Poland.

ABSTRACT

Targets of (58)Ni and (60)Ni with areal density between 71 and 105 μg/cm(2) backed with polyimide foil of 35-40 μg/cm(2) were prepared by sputtering with Ar ions produced by a home made sputtering device at the Target Laboratory, University of Jyväskylä. The efficiency of the procedure was about 20 %.

No MeSH data available.