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Soft UV nanoimprint lithography-designed highly sensitive substrates for SERS detection.

Cottat M, Lidgi-Guigui N, Tijunelyte I, Barbillon G, Hamouda F, Gogol P, Aassime A, Lourtioz JM, Bartenlian B, de la Chapelle ML - Nanoscale Res Lett (2014)

Bottom Line: Gold nanocylinders (GNCs) showed to be very sensitive and specific sensing surfaces.Indeed, we demonstrated that less than 4 ×10(6) avidin molecules were detected and contributed to the surface-enhanced Raman scattering (SERS) signal.Thus, the soft UV-NIL technique allows to obtain quickly very sensitive substrates for SERS biosensing on surfaces of 1 mm (2).

View Article: PubMed Central - PubMed

Affiliation: CSPBAT (UMR 7244), CNRS-Université Paris 13, 74 rue Marcel Cachin, 93017, Bobigny, France, maximilien.cottat@univ-paris13.fr.

ABSTRACT
We report on the use of soft UV nanoimprint lithography (UV-NIL) for the development of reproducible, millimeter-sized, and sensitive substrates for SERS detection. The used geometry for plasmonic nanostructures is the cylinder. Gold nanocylinders (GNCs) showed to be very sensitive and specific sensing surfaces. Indeed, we demonstrated that less than 4 ×10(6) avidin molecules were detected and contributed to the surface-enhanced Raman scattering (SERS) signal. Thus, the soft UV-NIL technique allows to obtain quickly very sensitive substrates for SERS biosensing on surfaces of 1 mm (2).

No MeSH data available.


UV-NIL.(a) Principle scheme of UV-NIL. (b) SEM image of Si master mold (diameter of approximately 220 nm, periodicity 400 nm).
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Fig1: UV-NIL.(a) Principle scheme of UV-NIL. (b) SEM image of Si master mold (diameter of approximately 220 nm, periodicity 400 nm).

Mentions: Figure 1a displays the main steps of the UV-NIL process. The first step of this technique is to fabricate a master mold. As done in previous studies, this master mold was fabricated using EBL on PMMA resist combined with reactive ion etching for the pattern transfer into the silicon substrate (see Figure 1b). The conditions of this transfer have been published in [17]. The use of a single master mold for all the samples studied here guarantees the reproducibility of the GNCs. The stamps were fabricated with the standard poly(dimethylsiloxane) (PDMS) diluted in hexane solvent in order to reduce the viscosity and thus to improve the penetration of the PDMS in nanoholes [21]. The stamp was pressed against PMMA/AMONIL resists, which were deposited on a glass substrate, using an EVG 620 mask aligner. The addition of solvent in the PDMS stamp also reduces the interface adhesion and allows easy separation between the stamp and the AMONIL resist, which is used for the imprint. We combined this patterning method with subsequent metal deposition and lift-off process. This procedure leads to a very regular grating of GNCs.Figure 1


Soft UV nanoimprint lithography-designed highly sensitive substrates for SERS detection.

Cottat M, Lidgi-Guigui N, Tijunelyte I, Barbillon G, Hamouda F, Gogol P, Aassime A, Lourtioz JM, Bartenlian B, de la Chapelle ML - Nanoscale Res Lett (2014)

UV-NIL.(a) Principle scheme of UV-NIL. (b) SEM image of Si master mold (diameter of approximately 220 nm, periodicity 400 nm).
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC4494019&req=5

Fig1: UV-NIL.(a) Principle scheme of UV-NIL. (b) SEM image of Si master mold (diameter of approximately 220 nm, periodicity 400 nm).
Mentions: Figure 1a displays the main steps of the UV-NIL process. The first step of this technique is to fabricate a master mold. As done in previous studies, this master mold was fabricated using EBL on PMMA resist combined with reactive ion etching for the pattern transfer into the silicon substrate (see Figure 1b). The conditions of this transfer have been published in [17]. The use of a single master mold for all the samples studied here guarantees the reproducibility of the GNCs. The stamps were fabricated with the standard poly(dimethylsiloxane) (PDMS) diluted in hexane solvent in order to reduce the viscosity and thus to improve the penetration of the PDMS in nanoholes [21]. The stamp was pressed against PMMA/AMONIL resists, which were deposited on a glass substrate, using an EVG 620 mask aligner. The addition of solvent in the PDMS stamp also reduces the interface adhesion and allows easy separation between the stamp and the AMONIL resist, which is used for the imprint. We combined this patterning method with subsequent metal deposition and lift-off process. This procedure leads to a very regular grating of GNCs.Figure 1

Bottom Line: Gold nanocylinders (GNCs) showed to be very sensitive and specific sensing surfaces.Indeed, we demonstrated that less than 4 ×10(6) avidin molecules were detected and contributed to the surface-enhanced Raman scattering (SERS) signal.Thus, the soft UV-NIL technique allows to obtain quickly very sensitive substrates for SERS biosensing on surfaces of 1 mm (2).

View Article: PubMed Central - PubMed

Affiliation: CSPBAT (UMR 7244), CNRS-Université Paris 13, 74 rue Marcel Cachin, 93017, Bobigny, France, maximilien.cottat@univ-paris13.fr.

ABSTRACT
We report on the use of soft UV nanoimprint lithography (UV-NIL) for the development of reproducible, millimeter-sized, and sensitive substrates for SERS detection. The used geometry for plasmonic nanostructures is the cylinder. Gold nanocylinders (GNCs) showed to be very sensitive and specific sensing surfaces. Indeed, we demonstrated that less than 4 ×10(6) avidin molecules were detected and contributed to the surface-enhanced Raman scattering (SERS) signal. Thus, the soft UV-NIL technique allows to obtain quickly very sensitive substrates for SERS biosensing on surfaces of 1 mm (2).

No MeSH data available.