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A flexible transparent gas barrier film employing the method of mixing ALD/MLD-grown Al2O3 and alucone layers.

Xiao W, Hui DY, Zheng C, Yu D, Qiang YY, Ping C, Xiang CL, Yi Z - Nanoscale Res Lett (2015)

Bottom Line: Furthermore, a bending test upon single Al2O3 layers showed an increased WVTR of 1.59 × 10(-3) g/m(2)/day.However, the film with a 4 nm alucone organic layer inserted into the center displayed improved surface roughness, barrier performance, and transmittance.After the bending test, the hybrid film with 4 nm equally distributed alucone maintained better surface roughness (0.339 ± 0.014 nm) and barrier properties (9.94 × 10(-5) g/m(2)/day).

View Article: PubMed Central - PubMed

Affiliation: State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Jilin, 130012 China.

ABSTRACT
Atomic layer deposition (ALD) has been widely reported as a novel method for thin film encapsulation (TFE) of organic light-emitting diodes and organic photovoltaic cells. Both organic and inorganic thin films can be deposited by ALD with a variety of precursors. In this work, the performances of Al2O3 thin films and Al2O3/alucone hybrid films have been investigated. The samples with a 50 nm Al2O3 inorganic layer deposited by ALD at a low temperature of 80°C showed higher surface roughness (0.503 ± 0.011 nm), higher water vapor transmission rate (WVTR) values (3.77 × 10(-4) g/m(2)/day), and lower transmittance values (61%) when compared with the Al2O3 (inorganic)/alucone (organic) hybrid structure under same conditions. Furthermore, a bending test upon single Al2O3 layers showed an increased WVTR of 1.59 × 10(-3) g/m(2)/day. However, the film with a 4 nm alucone organic layer inserted into the center displayed improved surface roughness, barrier performance, and transmittance. After the bending test, the hybrid film with 4 nm equally distributed alucone maintained better surface roughness (0.339 ± 0.014 nm) and barrier properties (9.94 × 10(-5) g/m(2)/day). This interesting phenomenon reveals that multilayer thin films consisting of inorganic layers and decentralized alucone organic components have the potential to be useful in TFE applications on flexible optical electronics.

No MeSH data available.


Related in: MedlinePlus

Experimental and simulated results of transmittance of the films based on Alq3(50 nm)/Ag (20 nm)/TFE/Air structure. The insert is a photo of Alq3 (50 nm)/Ag (20 nm)/film C structure on PET substrate.
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Fig8: Experimental and simulated results of transmittance of the films based on Alq3(50 nm)/Ag (20 nm)/TFE/Air structure. The insert is a photo of Alq3 (50 nm)/Ag (20 nm)/film C structure on PET substrate.

Mentions: Finally, the optical properties of TFE samples were measured as well as simulated. Figure 8 shows the simulated and experimental transmittance of Alq3 (50 nm)/Ag (20 nm)/TFE/air structures on a PET substrate before carrying out the bend test. For all tests, no obvious change in transmittance was observed, even after 600 iterations of the bending test. Film C (maximum transmittance of 69%) showed a slightly higher transmittance at the region of 400-580 nm compared with film B (maximum transmittance of 65%) (Figure 8). In addition, simulated results predicated that the hybrid film would have similar transmittance values with the single Al2O3 film over the whole visible region. This optical characteristic is beneficial due to the fact that alucone has superior photo permeability [25] and this may potentially be useful for the TFE design in top emitting organic light devices or organic photovoltaics.Figure 8


A flexible transparent gas barrier film employing the method of mixing ALD/MLD-grown Al2O3 and alucone layers.

Xiao W, Hui DY, Zheng C, Yu D, Qiang YY, Ping C, Xiang CL, Yi Z - Nanoscale Res Lett (2015)

Experimental and simulated results of transmittance of the films based on Alq3(50 nm)/Ag (20 nm)/TFE/Air structure. The insert is a photo of Alq3 (50 nm)/Ag (20 nm)/film C structure on PET substrate.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC4385290&req=5

Fig8: Experimental and simulated results of transmittance of the films based on Alq3(50 nm)/Ag (20 nm)/TFE/Air structure. The insert is a photo of Alq3 (50 nm)/Ag (20 nm)/film C structure on PET substrate.
Mentions: Finally, the optical properties of TFE samples were measured as well as simulated. Figure 8 shows the simulated and experimental transmittance of Alq3 (50 nm)/Ag (20 nm)/TFE/air structures on a PET substrate before carrying out the bend test. For all tests, no obvious change in transmittance was observed, even after 600 iterations of the bending test. Film C (maximum transmittance of 69%) showed a slightly higher transmittance at the region of 400-580 nm compared with film B (maximum transmittance of 65%) (Figure 8). In addition, simulated results predicated that the hybrid film would have similar transmittance values with the single Al2O3 film over the whole visible region. This optical characteristic is beneficial due to the fact that alucone has superior photo permeability [25] and this may potentially be useful for the TFE design in top emitting organic light devices or organic photovoltaics.Figure 8

Bottom Line: Furthermore, a bending test upon single Al2O3 layers showed an increased WVTR of 1.59 × 10(-3) g/m(2)/day.However, the film with a 4 nm alucone organic layer inserted into the center displayed improved surface roughness, barrier performance, and transmittance.After the bending test, the hybrid film with 4 nm equally distributed alucone maintained better surface roughness (0.339 ± 0.014 nm) and barrier properties (9.94 × 10(-5) g/m(2)/day).

View Article: PubMed Central - PubMed

Affiliation: State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Jilin, 130012 China.

ABSTRACT
Atomic layer deposition (ALD) has been widely reported as a novel method for thin film encapsulation (TFE) of organic light-emitting diodes and organic photovoltaic cells. Both organic and inorganic thin films can be deposited by ALD with a variety of precursors. In this work, the performances of Al2O3 thin films and Al2O3/alucone hybrid films have been investigated. The samples with a 50 nm Al2O3 inorganic layer deposited by ALD at a low temperature of 80°C showed higher surface roughness (0.503 ± 0.011 nm), higher water vapor transmission rate (WVTR) values (3.77 × 10(-4) g/m(2)/day), and lower transmittance values (61%) when compared with the Al2O3 (inorganic)/alucone (organic) hybrid structure under same conditions. Furthermore, a bending test upon single Al2O3 layers showed an increased WVTR of 1.59 × 10(-3) g/m(2)/day. However, the film with a 4 nm alucone organic layer inserted into the center displayed improved surface roughness, barrier performance, and transmittance. After the bending test, the hybrid film with 4 nm equally distributed alucone maintained better surface roughness (0.339 ± 0.014 nm) and barrier properties (9.94 × 10(-5) g/m(2)/day). This interesting phenomenon reveals that multilayer thin films consisting of inorganic layers and decentralized alucone organic components have the potential to be useful in TFE applications on flexible optical electronics.

No MeSH data available.


Related in: MedlinePlus