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A flexible transparent gas barrier film employing the method of mixing ALD/MLD-grown Al2O3 and alucone layers.

Xiao W, Hui DY, Zheng C, Yu D, Qiang YY, Ping C, Xiang CL, Yi Z - Nanoscale Res Lett (2015)

Bottom Line: Furthermore, a bending test upon single Al2O3 layers showed an increased WVTR of 1.59 × 10(-3) g/m(2)/day.However, the film with a 4 nm alucone organic layer inserted into the center displayed improved surface roughness, barrier performance, and transmittance.After the bending test, the hybrid film with 4 nm equally distributed alucone maintained better surface roughness (0.339 ± 0.014 nm) and barrier properties (9.94 × 10(-5) g/m(2)/day).

View Article: PubMed Central - PubMed

Affiliation: State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Jilin, 130012 China.

ABSTRACT
Atomic layer deposition (ALD) has been widely reported as a novel method for thin film encapsulation (TFE) of organic light-emitting diodes and organic photovoltaic cells. Both organic and inorganic thin films can be deposited by ALD with a variety of precursors. In this work, the performances of Al2O3 thin films and Al2O3/alucone hybrid films have been investigated. The samples with a 50 nm Al2O3 inorganic layer deposited by ALD at a low temperature of 80°C showed higher surface roughness (0.503 ± 0.011 nm), higher water vapor transmission rate (WVTR) values (3.77 × 10(-4) g/m(2)/day), and lower transmittance values (61%) when compared with the Al2O3 (inorganic)/alucone (organic) hybrid structure under same conditions. Furthermore, a bending test upon single Al2O3 layers showed an increased WVTR of 1.59 × 10(-3) g/m(2)/day. However, the film with a 4 nm alucone organic layer inserted into the center displayed improved surface roughness, barrier performance, and transmittance. After the bending test, the hybrid film with 4 nm equally distributed alucone maintained better surface roughness (0.339 ± 0.014 nm) and barrier properties (9.94 × 10(-5) g/m(2)/day). This interesting phenomenon reveals that multilayer thin films consisting of inorganic layers and decentralized alucone organic components have the potential to be useful in TFE applications on flexible optical electronics.

No MeSH data available.


Related in: MedlinePlus

The schematic diagram of water vapor permeation for Al2O3and Al2O3/alucone hybrid film in air.
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Fig6: The schematic diagram of water vapor permeation for Al2O3and Al2O3/alucone hybrid film in air.

Mentions: To evaluate the permeability of Al2O3/alucone films as a water diffusion barrier, we studied the films before and after the bending test. The Ca sample wafers (Glass/Ca (200 nm)/Al (100 nm)) were deposited by thermal evaporation equipment at 5 × 10−4 Pa without breaking the vacuum and were then transferred to a glove box. The area of Ca thin films was 1 × 1 cm2. The barrier films deposited by ALD/MLD on clean PET substrates were adhered to the Ca samples by UV sealant as shown in the inset of Figure 4 [26]. The calculated WVTR changes for different films before and after the bending test were shown in Figure 5. Before the bending test, the WVTR was found to be 3.77 × 10−4 g/m2/day (film A), 1.06 × 10−4 g/m2/day (film B), and 7.1 × 10−5 g/m2/day (film C). This was attributed to the fact that the alucone organic layer increases the permeation path for water vapor in the hybrid structure. It also reacts with the water vapor, decreasing the diffusion speed [11,27]. Figure 6 illustrates the water vapor permeation process for different thin film structures. With a 4-nm-thick alucone organic component divided into four equal layers, a 40% decrease in WVTR was obtained when comparing films B and C. As confirmed by our previous research [20], the increased proportion of Al2O3 in the hybrid structure leads to an improved barrier performance. However, after the bending test, the barrier performances demonstrated evidence of different degrees of damage. A notable increase from 3.77 × 10−4 to 1.59 × 10−3 g/m2/day in WVTR was obtained for film A, while a more subtle increase from 9.94 × 10−5 to 7.1 × 10−5 g/m2/day was achieved for film C. The results indicate that internal alucone organic layers improve flexibility under the same thicknesses. When the alucone organic layer was separated into separate layers, it leads to a more even distribution of stress in the laminates and reduced destruction [25].Figure 5


A flexible transparent gas barrier film employing the method of mixing ALD/MLD-grown Al2O3 and alucone layers.

Xiao W, Hui DY, Zheng C, Yu D, Qiang YY, Ping C, Xiang CL, Yi Z - Nanoscale Res Lett (2015)

The schematic diagram of water vapor permeation for Al2O3and Al2O3/alucone hybrid film in air.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC4385290&req=5

Fig6: The schematic diagram of water vapor permeation for Al2O3and Al2O3/alucone hybrid film in air.
Mentions: To evaluate the permeability of Al2O3/alucone films as a water diffusion barrier, we studied the films before and after the bending test. The Ca sample wafers (Glass/Ca (200 nm)/Al (100 nm)) were deposited by thermal evaporation equipment at 5 × 10−4 Pa without breaking the vacuum and were then transferred to a glove box. The area of Ca thin films was 1 × 1 cm2. The barrier films deposited by ALD/MLD on clean PET substrates were adhered to the Ca samples by UV sealant as shown in the inset of Figure 4 [26]. The calculated WVTR changes for different films before and after the bending test were shown in Figure 5. Before the bending test, the WVTR was found to be 3.77 × 10−4 g/m2/day (film A), 1.06 × 10−4 g/m2/day (film B), and 7.1 × 10−5 g/m2/day (film C). This was attributed to the fact that the alucone organic layer increases the permeation path for water vapor in the hybrid structure. It also reacts with the water vapor, decreasing the diffusion speed [11,27]. Figure 6 illustrates the water vapor permeation process for different thin film structures. With a 4-nm-thick alucone organic component divided into four equal layers, a 40% decrease in WVTR was obtained when comparing films B and C. As confirmed by our previous research [20], the increased proportion of Al2O3 in the hybrid structure leads to an improved barrier performance. However, after the bending test, the barrier performances demonstrated evidence of different degrees of damage. A notable increase from 3.77 × 10−4 to 1.59 × 10−3 g/m2/day in WVTR was obtained for film A, while a more subtle increase from 9.94 × 10−5 to 7.1 × 10−5 g/m2/day was achieved for film C. The results indicate that internal alucone organic layers improve flexibility under the same thicknesses. When the alucone organic layer was separated into separate layers, it leads to a more even distribution of stress in the laminates and reduced destruction [25].Figure 5

Bottom Line: Furthermore, a bending test upon single Al2O3 layers showed an increased WVTR of 1.59 × 10(-3) g/m(2)/day.However, the film with a 4 nm alucone organic layer inserted into the center displayed improved surface roughness, barrier performance, and transmittance.After the bending test, the hybrid film with 4 nm equally distributed alucone maintained better surface roughness (0.339 ± 0.014 nm) and barrier properties (9.94 × 10(-5) g/m(2)/day).

View Article: PubMed Central - PubMed

Affiliation: State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Jilin, 130012 China.

ABSTRACT
Atomic layer deposition (ALD) has been widely reported as a novel method for thin film encapsulation (TFE) of organic light-emitting diodes and organic photovoltaic cells. Both organic and inorganic thin films can be deposited by ALD with a variety of precursors. In this work, the performances of Al2O3 thin films and Al2O3/alucone hybrid films have been investigated. The samples with a 50 nm Al2O3 inorganic layer deposited by ALD at a low temperature of 80°C showed higher surface roughness (0.503 ± 0.011 nm), higher water vapor transmission rate (WVTR) values (3.77 × 10(-4) g/m(2)/day), and lower transmittance values (61%) when compared with the Al2O3 (inorganic)/alucone (organic) hybrid structure under same conditions. Furthermore, a bending test upon single Al2O3 layers showed an increased WVTR of 1.59 × 10(-3) g/m(2)/day. However, the film with a 4 nm alucone organic layer inserted into the center displayed improved surface roughness, barrier performance, and transmittance. After the bending test, the hybrid film with 4 nm equally distributed alucone maintained better surface roughness (0.339 ± 0.014 nm) and barrier properties (9.94 × 10(-5) g/m(2)/day). This interesting phenomenon reveals that multilayer thin films consisting of inorganic layers and decentralized alucone organic components have the potential to be useful in TFE applications on flexible optical electronics.

No MeSH data available.


Related in: MedlinePlus