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Crystallographic orientation-dependent pattern replication in direct imprint of aluminum nanostructures.

Yuan Y, Zhang J, Sun T, Liu C, Geng Y, Yan Y, Jin P - Nanoscale Res Lett (2015)

Bottom Line: We investigate the influence of crystallographic orientation on the microscopic deformation behavior of the substrate materials and its correlation with the macroscopic pattern replications.Furthermore, the surface mechanical properties of the patterned structures are qualitatively characterized by nanoindentation tests.It is found that the (010) orientation leads to a better quality of pattern replication of single-crystalline aluminum than the (111) orientation.

View Article: PubMed Central - PubMed

Affiliation: Center for Precision Engineering, Harbin Institute of Technology, Harbin, 150001 People's Republic of China.

ABSTRACT
In the present work, we perform molecular dynamics simulations corroborated by experimental validations to elucidate the underlying deformation mechanisms of single-crystalline aluminum under direct imprint using a rigid silicon master. We investigate the influence of crystallographic orientation on the microscopic deformation behavior of the substrate materials and its correlation with the macroscopic pattern replications. Furthermore, the surface mechanical properties of the patterned structures are qualitatively characterized by nanoindentation tests. Our results reveal that dislocation slip and deformation twinning are two primary plastic deformation modes of single-crystalline aluminum under the direct imprint. However, both the competition between the individual deformation mechanisms and the geometry between activated dislocation slip systems and imprinted surface vary with surface orientation, which in turn leads to a strong crystallographic orientation dependence of the pattern replications. It is found that the (010) orientation leads to a better quality of pattern replication of single-crystalline aluminum than the (111) orientation.

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MD model of direct imprint of Al substrate using Si master. (a) Atomic configuration of MD model. Atoms are colored according to their virtual types, as red, blue, and yellow colors indicate boundary, mobile, and master atoms, respectively. (b) Side view and (c) bottom view of single V-shaped tooth in the master. Atoms in (c) are colored according to their atomic heights.
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Fig1: MD model of direct imprint of Al substrate using Si master. (a) Atomic configuration of MD model. Atoms are colored according to their virtual types, as red, blue, and yellow colors indicate boundary, mobile, and master atoms, respectively. (b) Side view and (c) bottom view of single V-shaped tooth in the master. Atoms in (c) are colored according to their atomic heights.

Mentions: Figure 1a shows that the MD model of direct imprint is composed of a single-crystalline aluminum substrate and a silicon master. The substrate has a dimension of 63, 12, and 32 nm in the X, Y, and Z direction, respectively, and contains approximately 1.5 million atoms. The substrate consists of two kinds of atoms, the boundary atoms that are fixed in space and the mobile atoms which motions follow Newton’s equation of motion, respectively. To examine the influence of crystallographic orientation on the direct imprint process, two single-crystalline aluminum substrates with (010) and (111) free surfaces are considered. The silicon master has four V-shaped teeth on its surface. Figure 1b,c presents the side and bottom views of a single tooth geometry, respectively. The length in Z direction and the height in Y direction of the tooth are 32 and 3.2 nm, respectively. The angle between the two facets of each tooth is the same as 90°. The silicon master is treated as a rigid body throughout the direct imprint process. The atomic interactions in the Al substrate and that between the Al substrate and the Si master are molded by embedded atom method and Lennard-Jones potential, respectively [19].Figure 1


Crystallographic orientation-dependent pattern replication in direct imprint of aluminum nanostructures.

Yuan Y, Zhang J, Sun T, Liu C, Geng Y, Yan Y, Jin P - Nanoscale Res Lett (2015)

MD model of direct imprint of Al substrate using Si master. (a) Atomic configuration of MD model. Atoms are colored according to their virtual types, as red, blue, and yellow colors indicate boundary, mobile, and master atoms, respectively. (b) Side view and (c) bottom view of single V-shaped tooth in the master. Atoms in (c) are colored according to their atomic heights.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC4385152&req=5

Fig1: MD model of direct imprint of Al substrate using Si master. (a) Atomic configuration of MD model. Atoms are colored according to their virtual types, as red, blue, and yellow colors indicate boundary, mobile, and master atoms, respectively. (b) Side view and (c) bottom view of single V-shaped tooth in the master. Atoms in (c) are colored according to their atomic heights.
Mentions: Figure 1a shows that the MD model of direct imprint is composed of a single-crystalline aluminum substrate and a silicon master. The substrate has a dimension of 63, 12, and 32 nm in the X, Y, and Z direction, respectively, and contains approximately 1.5 million atoms. The substrate consists of two kinds of atoms, the boundary atoms that are fixed in space and the mobile atoms which motions follow Newton’s equation of motion, respectively. To examine the influence of crystallographic orientation on the direct imprint process, two single-crystalline aluminum substrates with (010) and (111) free surfaces are considered. The silicon master has four V-shaped teeth on its surface. Figure 1b,c presents the side and bottom views of a single tooth geometry, respectively. The length in Z direction and the height in Y direction of the tooth are 32 and 3.2 nm, respectively. The angle between the two facets of each tooth is the same as 90°. The silicon master is treated as a rigid body throughout the direct imprint process. The atomic interactions in the Al substrate and that between the Al substrate and the Si master are molded by embedded atom method and Lennard-Jones potential, respectively [19].Figure 1

Bottom Line: We investigate the influence of crystallographic orientation on the microscopic deformation behavior of the substrate materials and its correlation with the macroscopic pattern replications.Furthermore, the surface mechanical properties of the patterned structures are qualitatively characterized by nanoindentation tests.It is found that the (010) orientation leads to a better quality of pattern replication of single-crystalline aluminum than the (111) orientation.

View Article: PubMed Central - PubMed

Affiliation: Center for Precision Engineering, Harbin Institute of Technology, Harbin, 150001 People's Republic of China.

ABSTRACT
In the present work, we perform molecular dynamics simulations corroborated by experimental validations to elucidate the underlying deformation mechanisms of single-crystalline aluminum under direct imprint using a rigid silicon master. We investigate the influence of crystallographic orientation on the microscopic deformation behavior of the substrate materials and its correlation with the macroscopic pattern replications. Furthermore, the surface mechanical properties of the patterned structures are qualitatively characterized by nanoindentation tests. Our results reveal that dislocation slip and deformation twinning are two primary plastic deformation modes of single-crystalline aluminum under the direct imprint. However, both the competition between the individual deformation mechanisms and the geometry between activated dislocation slip systems and imprinted surface vary with surface orientation, which in turn leads to a strong crystallographic orientation dependence of the pattern replications. It is found that the (010) orientation leads to a better quality of pattern replication of single-crystalline aluminum than the (111) orientation.

No MeSH data available.


Related in: MedlinePlus