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Crystallographic orientation-dependent pattern replication in direct imprint of aluminum nanostructures.

Yuan Y, Zhang J, Sun T, Liu C, Geng Y, Yan Y, Jin P - Nanoscale Res Lett (2015)

Bottom Line: We investigate the influence of crystallographic orientation on the microscopic deformation behavior of the substrate materials and its correlation with the macroscopic pattern replications.Furthermore, the surface mechanical properties of the patterned structures are qualitatively characterized by nanoindentation tests.It is found that the (010) orientation leads to a better quality of pattern replication of single-crystalline aluminum than the (111) orientation.

View Article: PubMed Central - PubMed

Affiliation: Center for Precision Engineering, Harbin Institute of Technology, Harbin, 150001 People's Republic of China.

ABSTRACT
In the present work, we perform molecular dynamics simulations corroborated by experimental validations to elucidate the underlying deformation mechanisms of single-crystalline aluminum under direct imprint using a rigid silicon master. We investigate the influence of crystallographic orientation on the microscopic deformation behavior of the substrate materials and its correlation with the macroscopic pattern replications. Furthermore, the surface mechanical properties of the patterned structures are qualitatively characterized by nanoindentation tests. Our results reveal that dislocation slip and deformation twinning are two primary plastic deformation modes of single-crystalline aluminum under the direct imprint. However, both the competition between the individual deformation mechanisms and the geometry between activated dislocation slip systems and imprinted surface vary with surface orientation, which in turn leads to a strong crystallographic orientation dependence of the pattern replications. It is found that the (010) orientation leads to a better quality of pattern replication of single-crystalline aluminum than the (111) orientation.

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Direct imprint results. AFM images of patterned structures for (a) (010) orientation and (c) (111) orientation. Enlarged view for (b) (010) orientation and (d) (111) orientation. (e) The cross-sectional profiles in (b) and (d).
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Fig10: Direct imprint results. AFM images of patterned structures for (a) (010) orientation and (c) (111) orientation. Enlarged view for (b) (010) orientation and (d) (111) orientation. (e) The cross-sectional profiles in (b) and (d).

Mentions: In addition to MD simulations, direct imprint experiments are also carried out on single-crystalline Al substrates with different surface orientations. Figure 10a,c presents AFM images of the patterned structures on the Al(010) and Al(111) surfaces, respectively. It is seen from Figure 10 that for each surface orientation, there are aligned concave groove patterns formed on the sample surface, accompanied with surface pileup residing on both sides of the groove. However, both the groove width and the volume of surface pileup are larger for the (010) orientation than that for the (111) orientation. Figure 10b,d respectively shows the enlarged views of representative zones in Figure 10a,c, and Figure 10e further plots their cross-sectional profiles. It is found from Figure 10e that for each surface orientation, the spacing between each concave groove is the same as 4 μm, which is consistent with the geometry of the Si master. However, the geometry of individual grooves is highly dependent on the surface orientation. For the (010) orientation, Figure 10e shows that the groove depth is close to 300 nm of the tooth height of the Si master, indicating that the plastic recovery during the withdrawing stage is negligible. Furthermore, the surface pileup shows high symmetry with respect to the groove. However, the groove depth for the (111) orientation is 88 nm, and the symmetry of the surface pileup is deteriorated.Figure 10


Crystallographic orientation-dependent pattern replication in direct imprint of aluminum nanostructures.

Yuan Y, Zhang J, Sun T, Liu C, Geng Y, Yan Y, Jin P - Nanoscale Res Lett (2015)

Direct imprint results. AFM images of patterned structures for (a) (010) orientation and (c) (111) orientation. Enlarged view for (b) (010) orientation and (d) (111) orientation. (e) The cross-sectional profiles in (b) and (d).
© Copyright Policy - open-access
Related In: Results  -  Collection

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getmorefigures.php?uid=PMC4385152&req=5

Fig10: Direct imprint results. AFM images of patterned structures for (a) (010) orientation and (c) (111) orientation. Enlarged view for (b) (010) orientation and (d) (111) orientation. (e) The cross-sectional profiles in (b) and (d).
Mentions: In addition to MD simulations, direct imprint experiments are also carried out on single-crystalline Al substrates with different surface orientations. Figure 10a,c presents AFM images of the patterned structures on the Al(010) and Al(111) surfaces, respectively. It is seen from Figure 10 that for each surface orientation, there are aligned concave groove patterns formed on the sample surface, accompanied with surface pileup residing on both sides of the groove. However, both the groove width and the volume of surface pileup are larger for the (010) orientation than that for the (111) orientation. Figure 10b,d respectively shows the enlarged views of representative zones in Figure 10a,c, and Figure 10e further plots their cross-sectional profiles. It is found from Figure 10e that for each surface orientation, the spacing between each concave groove is the same as 4 μm, which is consistent with the geometry of the Si master. However, the geometry of individual grooves is highly dependent on the surface orientation. For the (010) orientation, Figure 10e shows that the groove depth is close to 300 nm of the tooth height of the Si master, indicating that the plastic recovery during the withdrawing stage is negligible. Furthermore, the surface pileup shows high symmetry with respect to the groove. However, the groove depth for the (111) orientation is 88 nm, and the symmetry of the surface pileup is deteriorated.Figure 10

Bottom Line: We investigate the influence of crystallographic orientation on the microscopic deformation behavior of the substrate materials and its correlation with the macroscopic pattern replications.Furthermore, the surface mechanical properties of the patterned structures are qualitatively characterized by nanoindentation tests.It is found that the (010) orientation leads to a better quality of pattern replication of single-crystalline aluminum than the (111) orientation.

View Article: PubMed Central - PubMed

Affiliation: Center for Precision Engineering, Harbin Institute of Technology, Harbin, 150001 People's Republic of China.

ABSTRACT
In the present work, we perform molecular dynamics simulations corroborated by experimental validations to elucidate the underlying deformation mechanisms of single-crystalline aluminum under direct imprint using a rigid silicon master. We investigate the influence of crystallographic orientation on the microscopic deformation behavior of the substrate materials and its correlation with the macroscopic pattern replications. Furthermore, the surface mechanical properties of the patterned structures are qualitatively characterized by nanoindentation tests. Our results reveal that dislocation slip and deformation twinning are two primary plastic deformation modes of single-crystalline aluminum under the direct imprint. However, both the competition between the individual deformation mechanisms and the geometry between activated dislocation slip systems and imprinted surface vary with surface orientation, which in turn leads to a strong crystallographic orientation dependence of the pattern replications. It is found that the (010) orientation leads to a better quality of pattern replication of single-crystalline aluminum than the (111) orientation.

No MeSH data available.


Related in: MedlinePlus