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Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering.

Majeed A, He J, Jiao L, Zhong X, Sheng Z - Nanoscale Res Lett (2015)

Bottom Line: X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous.Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures.The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

View Article: PubMed Central - PubMed

Affiliation: Key Laboratory for Laser Plasmas (Ministry of Education) and State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, 200240 China ; Department of Physics, University of Azad Jammu & Kashmir, Muzaffarabad, A.K Pakistan.

ABSTRACT
Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures. Primary rat osteoblasts (MC3T3-E1) cells have been cultured on nanostructured TiO2 films fabricated at different conditions of substrate bias and working pressures. The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

No MeSH data available.


Related in: MedlinePlus

Magnitude of dynamic advancing contact angles and the corresponding receding contact angles for each sample. Sample 1, P = 3 Pa, 0 V; sample 2, P = 5 Pa, 0 V; sample 3, P = 3 Pa, −50 V.
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Fig5: Magnitude of dynamic advancing contact angles and the corresponding receding contact angles for each sample. Sample 1, P = 3 Pa, 0 V; sample 2, P = 5 Pa, 0 V; sample 3, P = 3 Pa, −50 V.

Mentions: The advancing contact angles for samples 1, 2, and 3 have been estimated to be 88.0°, 72.6°, and 92.4°, respectively, while the corresponding receding contact angles have been measured to be 10.1°, 9.8°, and 40.7°, respectively, as illustrated by Figure 5. The contact angle hystereses for samples 1, 2, and 3, determined from their corresponding advancing and receding angles, are 77.90, 62.80, and 51.70, respectively.Figure 5


Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering.

Majeed A, He J, Jiao L, Zhong X, Sheng Z - Nanoscale Res Lett (2015)

Magnitude of dynamic advancing contact angles and the corresponding receding contact angles for each sample. Sample 1, P = 3 Pa, 0 V; sample 2, P = 5 Pa, 0 V; sample 3, P = 3 Pa, −50 V.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC4385009&req=5

Fig5: Magnitude of dynamic advancing contact angles and the corresponding receding contact angles for each sample. Sample 1, P = 3 Pa, 0 V; sample 2, P = 5 Pa, 0 V; sample 3, P = 3 Pa, −50 V.
Mentions: The advancing contact angles for samples 1, 2, and 3 have been estimated to be 88.0°, 72.6°, and 92.4°, respectively, while the corresponding receding contact angles have been measured to be 10.1°, 9.8°, and 40.7°, respectively, as illustrated by Figure 5. The contact angle hystereses for samples 1, 2, and 3, determined from their corresponding advancing and receding angles, are 77.90, 62.80, and 51.70, respectively.Figure 5

Bottom Line: X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous.Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures.The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

View Article: PubMed Central - PubMed

Affiliation: Key Laboratory for Laser Plasmas (Ministry of Education) and State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, 200240 China ; Department of Physics, University of Azad Jammu & Kashmir, Muzaffarabad, A.K Pakistan.

ABSTRACT
Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures. Primary rat osteoblasts (MC3T3-E1) cells have been cultured on nanostructured TiO2 films fabricated at different conditions of substrate bias and working pressures. The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

No MeSH data available.


Related in: MedlinePlus