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Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering.

Majeed A, He J, Jiao L, Zhong X, Sheng Z - Nanoscale Res Lett (2015)

Bottom Line: X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous.Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures.The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

View Article: PubMed Central - PubMed

Affiliation: Key Laboratory for Laser Plasmas (Ministry of Education) and State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, 200240 China ; Department of Physics, University of Azad Jammu & Kashmir, Muzaffarabad, A.K Pakistan.

ABSTRACT
Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures. Primary rat osteoblasts (MC3T3-E1) cells have been cultured on nanostructured TiO2 films fabricated at different conditions of substrate bias and working pressures. The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

No MeSH data available.


Magnitude of RMS roughness and static water contact angles for each sample. Sample 1, P = 3 Pa, 0 V; sample 2, P = 5 Pa, 0 V; sample 3, P = 3 Pa, −50 V.
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Fig4: Magnitude of RMS roughness and static water contact angles for each sample. Sample 1, P = 3 Pa, 0 V; sample 2, P = 5 Pa, 0 V; sample 3, P = 3 Pa, −50 V.

Mentions: The variations in water contact angle for the samples deposited at 3 and 5 Pa without substrate bias and also at 3 Pa with bias (−50 V), in static mode, together with their RMS roughness are shown in Figure 4. The static water contact angle for the samples deposited at 3 and 5 Pa without substrate bias was found to be varying from 74.3° to 69.70° when the RMS roughness value was increased from 176.50 to 202.76 nm. The static water contact angle (at varying bias conditions of the substrate from 0 to −50 V) for the samples deposited at 3 Pa was found to be altering from 74.30° to 95.73°, when the RMS roughness value was decreased from 176.50 to 9.301 nm.Figure 4


Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering.

Majeed A, He J, Jiao L, Zhong X, Sheng Z - Nanoscale Res Lett (2015)

Magnitude of RMS roughness and static water contact angles for each sample. Sample 1, P = 3 Pa, 0 V; sample 2, P = 5 Pa, 0 V; sample 3, P = 3 Pa, −50 V.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC4385009&req=5

Fig4: Magnitude of RMS roughness and static water contact angles for each sample. Sample 1, P = 3 Pa, 0 V; sample 2, P = 5 Pa, 0 V; sample 3, P = 3 Pa, −50 V.
Mentions: The variations in water contact angle for the samples deposited at 3 and 5 Pa without substrate bias and also at 3 Pa with bias (−50 V), in static mode, together with their RMS roughness are shown in Figure 4. The static water contact angle for the samples deposited at 3 and 5 Pa without substrate bias was found to be varying from 74.3° to 69.70° when the RMS roughness value was increased from 176.50 to 202.76 nm. The static water contact angle (at varying bias conditions of the substrate from 0 to −50 V) for the samples deposited at 3 Pa was found to be altering from 74.30° to 95.73°, when the RMS roughness value was decreased from 176.50 to 9.301 nm.Figure 4

Bottom Line: X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous.Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures.The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

View Article: PubMed Central - PubMed

Affiliation: Key Laboratory for Laser Plasmas (Ministry of Education) and State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, 200240 China ; Department of Physics, University of Azad Jammu & Kashmir, Muzaffarabad, A.K Pakistan.

ABSTRACT
Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures. Primary rat osteoblasts (MC3T3-E1) cells have been cultured on nanostructured TiO2 films fabricated at different conditions of substrate bias and working pressures. The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

No MeSH data available.