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Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering.

Majeed A, He J, Jiao L, Zhong X, Sheng Z - Nanoscale Res Lett (2015)

Bottom Line: X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous.Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures.The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

View Article: PubMed Central - PubMed

Affiliation: Key Laboratory for Laser Plasmas (Ministry of Education) and State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, 200240 China ; Department of Physics, University of Azad Jammu & Kashmir, Muzaffarabad, A.K Pakistan.

ABSTRACT
Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures. Primary rat osteoblasts (MC3T3-E1) cells have been cultured on nanostructured TiO2 films fabricated at different conditions of substrate bias and working pressures. The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

No MeSH data available.


Related in: MedlinePlus

AFM images of titanium dioxide layer deposition by RF magnetron sputtering at (a) 3 Pa and (b) 5 Pa, without substrate bias, and (c) 3 Pa with a substrate bias of −50 V.
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Fig3: AFM images of titanium dioxide layer deposition by RF magnetron sputtering at (a) 3 Pa and (b) 5 Pa, without substrate bias, and (c) 3 Pa with a substrate bias of −50 V.

Mentions: The AFM images of surface structure of TiO2 films deposited by RF magnetron sputtering at a constant power of 150 W and at different working pressures, i.e., (3, 5) Pa, have been shown in Figure 2a,b for unbiased substrates. Both the surface structures exhibit the porous configuration. The results revealed that at working pressures of 3 and 5 Pa, the films deposited on unbiased substrates possessed very high surface roughness with some valleys and almost spherical agglomerates. The roughness of these thin films was characterized according to RMS roughness value. In our experiment, the RMS roughness values were estimated to be 176.50 and 202.76 nm for the thin films grown at 3 and 5 Pa, respectively, for the unbiased substrate. At high working pressures, sputtered atoms or clusters reached the substrate with reduced kinetic energies, which caused the surface roughness to increase [22,23]. The employing of substrate bias to the film at a working pressure of 3 Pa modified the surface morphology; as seen, the agglomerates grew up along the surface but collapsed in the vertical direction. Along with the disappearance of the so-called profile valleys, the RMS roughness showed an obvious reduction from 176.50 to 9.30 nm as the substrate bias (V) changed from 0 to −50 V, as shown in Figure 3c. The surface-smoothening effect was mainly attributed to the ion bombardment for which the arriving adatoms could diffuse more freely onto the film surface [29].Figure 3


Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering.

Majeed A, He J, Jiao L, Zhong X, Sheng Z - Nanoscale Res Lett (2015)

AFM images of titanium dioxide layer deposition by RF magnetron sputtering at (a) 3 Pa and (b) 5 Pa, without substrate bias, and (c) 3 Pa with a substrate bias of −50 V.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC4385009&req=5

Fig3: AFM images of titanium dioxide layer deposition by RF magnetron sputtering at (a) 3 Pa and (b) 5 Pa, without substrate bias, and (c) 3 Pa with a substrate bias of −50 V.
Mentions: The AFM images of surface structure of TiO2 films deposited by RF magnetron sputtering at a constant power of 150 W and at different working pressures, i.e., (3, 5) Pa, have been shown in Figure 2a,b for unbiased substrates. Both the surface structures exhibit the porous configuration. The results revealed that at working pressures of 3 and 5 Pa, the films deposited on unbiased substrates possessed very high surface roughness with some valleys and almost spherical agglomerates. The roughness of these thin films was characterized according to RMS roughness value. In our experiment, the RMS roughness values were estimated to be 176.50 and 202.76 nm for the thin films grown at 3 and 5 Pa, respectively, for the unbiased substrate. At high working pressures, sputtered atoms or clusters reached the substrate with reduced kinetic energies, which caused the surface roughness to increase [22,23]. The employing of substrate bias to the film at a working pressure of 3 Pa modified the surface morphology; as seen, the agglomerates grew up along the surface but collapsed in the vertical direction. Along with the disappearance of the so-called profile valleys, the RMS roughness showed an obvious reduction from 176.50 to 9.30 nm as the substrate bias (V) changed from 0 to −50 V, as shown in Figure 3c. The surface-smoothening effect was mainly attributed to the ion bombardment for which the arriving adatoms could diffuse more freely onto the film surface [29].Figure 3

Bottom Line: X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous.Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures.The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

View Article: PubMed Central - PubMed

Affiliation: Key Laboratory for Laser Plasmas (Ministry of Education) and State Key Laboratory of Advanced Optical Communication Systems and Networks, Department of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, 200240 China ; Department of Physics, University of Azad Jammu & Kashmir, Muzaffarabad, A.K Pakistan.

ABSTRACT
Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wettability of TiO2 films, grown in a plasma environment, under biased and unbiased substrate conditions are reported according to the said parameters of RF power and the working pressures. Primary rat osteoblasts (MC3T3-E1) cells have been cultured on nanostructured TiO2 films fabricated at different conditions of substrate bias and working pressures. The effects of roughness and hydrophilicity of nanostructured TiO2 films on cell density and cell spreading have been discussed.

No MeSH data available.


Related in: MedlinePlus