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High-throughput nanofabrication of infra-red and chiral metamaterials using nanospherical-lens lithography.

Chang YC, Lu SC, Chung HC, Wang SM, Tsai TD, Guo TF - Sci Rep (2013)

Bottom Line: By replacing the light source with a hand-held ultraviolet lamp, its asymmetric light emission pattern produces the elliptical-shaped photoresist holes after passing through the spheres.The long axis of the ellipse is parallel to the lamp direction.This method is both high-throughput and low-cost, which is a powerful tool for future infra-red metamaterials applications.

View Article: PubMed Central - PubMed

Affiliation: Department of Photonics and Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 701, Taiwan.

ABSTRACT
Various infra-red and planar chiral metamaterials were fabricated using the modified Nanospherical-Lens Lithography. By replacing the light source with a hand-held ultraviolet lamp, its asymmetric light emission pattern produces the elliptical-shaped photoresist holes after passing through the spheres. The long axis of the ellipse is parallel to the lamp direction. The fabricated ellipse arrays exhibit localized surface plasmon resonance in mid-infra-red and are ideal platforms for surface enhanced infra-red absorption (SEIRA). We also demonstrate a way to design and fabricate complicated patterns by tuning parameters in each exposure step. This method is both high-throughput and low-cost, which is a powerful tool for future infra-red metamaterials applications.

No MeSH data available.


Related in: MedlinePlus

(a) Schematical illustration of multiple exposures. The vertical distance between UV lamp and the sample is kept at 15 cm. The sample can be rotated and shifted along one direction. Each exposure is denoted by 3 parameters. EX(Sx, Angle, Duration). “X” denotes the exposure number, “Sx” the shifting distance, “Angle” the angle between the sample and the lamp, and “Duration” the exposure duration. Multiple exposures after different rotating angles at different Sx can produce different types of metamaterials. (b) Simulated field energy distributions across the xz-plane when exposure the samples at a shifted location. The light is focused at an offset center location.
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f5: (a) Schematical illustration of multiple exposures. The vertical distance between UV lamp and the sample is kept at 15 cm. The sample can be rotated and shifted along one direction. Each exposure is denoted by 3 parameters. EX(Sx, Angle, Duration). “X” denotes the exposure number, “Sx” the shifting distance, “Angle” the angle between the sample and the lamp, and “Duration” the exposure duration. Multiple exposures after different rotating angles at different Sx can produce different types of metamaterials. (b) Simulated field energy distributions across the xz-plane when exposure the samples at a shifted location. The light is focused at an offset center location.

Mentions: In addition to the nano-ellipse arrays, the proposed method can be used to fabricate more complex-shaped metamaterials after multiple exposures. Fig. 5(a) illustrates the experimental configuration for the multiple exposures. The UV lamp is positioned at a constant height of 15 cm above the sample. The sample can be rotated or shifted along the direction perpendicular to the lamp direction, where Sx denotes the shifting distance. The sample shift causes the UV light to incident the surface at an angle. Fig. 5(b) illustrates the simulated field energy distribution across the xz-plane near a nanosphere at a diameter of 1 μm when the UV light (λ = 365 nm) is incident to the surface at an angle of 30°. The field energy distribution reveals that the incident light exposes the underneath photoresist with an offset center position, which is useful to fabricate complicated metamaterials when exposing with a line-shaped UV lamp.


High-throughput nanofabrication of infra-red and chiral metamaterials using nanospherical-lens lithography.

Chang YC, Lu SC, Chung HC, Wang SM, Tsai TD, Guo TF - Sci Rep (2013)

(a) Schematical illustration of multiple exposures. The vertical distance between UV lamp and the sample is kept at 15 cm. The sample can be rotated and shifted along one direction. Each exposure is denoted by 3 parameters. EX(Sx, Angle, Duration). “X” denotes the exposure number, “Sx” the shifting distance, “Angle” the angle between the sample and the lamp, and “Duration” the exposure duration. Multiple exposures after different rotating angles at different Sx can produce different types of metamaterials. (b) Simulated field energy distributions across the xz-plane when exposure the samples at a shifted location. The light is focused at an offset center location.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3842549&req=5

f5: (a) Schematical illustration of multiple exposures. The vertical distance between UV lamp and the sample is kept at 15 cm. The sample can be rotated and shifted along one direction. Each exposure is denoted by 3 parameters. EX(Sx, Angle, Duration). “X” denotes the exposure number, “Sx” the shifting distance, “Angle” the angle between the sample and the lamp, and “Duration” the exposure duration. Multiple exposures after different rotating angles at different Sx can produce different types of metamaterials. (b) Simulated field energy distributions across the xz-plane when exposure the samples at a shifted location. The light is focused at an offset center location.
Mentions: In addition to the nano-ellipse arrays, the proposed method can be used to fabricate more complex-shaped metamaterials after multiple exposures. Fig. 5(a) illustrates the experimental configuration for the multiple exposures. The UV lamp is positioned at a constant height of 15 cm above the sample. The sample can be rotated or shifted along the direction perpendicular to the lamp direction, where Sx denotes the shifting distance. The sample shift causes the UV light to incident the surface at an angle. Fig. 5(b) illustrates the simulated field energy distribution across the xz-plane near a nanosphere at a diameter of 1 μm when the UV light (λ = 365 nm) is incident to the surface at an angle of 30°. The field energy distribution reveals that the incident light exposes the underneath photoresist with an offset center position, which is useful to fabricate complicated metamaterials when exposing with a line-shaped UV lamp.

Bottom Line: By replacing the light source with a hand-held ultraviolet lamp, its asymmetric light emission pattern produces the elliptical-shaped photoresist holes after passing through the spheres.The long axis of the ellipse is parallel to the lamp direction.This method is both high-throughput and low-cost, which is a powerful tool for future infra-red metamaterials applications.

View Article: PubMed Central - PubMed

Affiliation: Department of Photonics and Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 701, Taiwan.

ABSTRACT
Various infra-red and planar chiral metamaterials were fabricated using the modified Nanospherical-Lens Lithography. By replacing the light source with a hand-held ultraviolet lamp, its asymmetric light emission pattern produces the elliptical-shaped photoresist holes after passing through the spheres. The long axis of the ellipse is parallel to the lamp direction. The fabricated ellipse arrays exhibit localized surface plasmon resonance in mid-infra-red and are ideal platforms for surface enhanced infra-red absorption (SEIRA). We also demonstrate a way to design and fabricate complicated patterns by tuning parameters in each exposure step. This method is both high-throughput and low-cost, which is a powerful tool for future infra-red metamaterials applications.

No MeSH data available.


Related in: MedlinePlus