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Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films.

Hudaya C, Park JH, Lee JK - Nanoscale Res Lett (2012)

Bottom Line: Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity.Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated.The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

View Article: PubMed Central - HTML - PubMed

Affiliation: Advanced Energy Materials Processing Laboratory, Energy Storage Research Center, Korea Institute of Science and Technology, Hwarangno 14 gil 5, Seongbuk-gu, Seoul, 136-791, Republic of Korea. leejk@kist.re.kr.

ABSTRACT
An alternative indium-free material for transparent conducting oxides of fluorine-doped tin oxide [FTO] thin films deposited on polyethylene terephthalate [PET] was prepared by electron cyclotron resonance - metal organic chemical vapor deposition [ECR-MOCVD]. One of the essential issues regarding metal oxide film deposition is the sheet resistance uniformity of the film. Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity. Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated. The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

No MeSH data available.


Related in: MedlinePlus

Contour maps of an FTO thin film on a PET substrate for working pressure variations. The working pressures were varied at (a) 5 mTorr, (b) 7.5 mTorr, (c) 10 mTorr, (d) 12.5 mTorr, and (e) 15 mTorr. (f) The sheet resistance uniformity and figure of merit of the FTO thin film under working pressure variations.
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Figure 4: Contour maps of an FTO thin film on a PET substrate for working pressure variations. The working pressures were varied at (a) 5 mTorr, (b) 7.5 mTorr, (c) 10 mTorr, (d) 12.5 mTorr, and (e) 15 mTorr. (f) The sheet resistance uniformity and figure of merit of the FTO thin film under working pressure variations.

Mentions: Figure 4a to 4e show the contour maps for the experiments examining the working pressure variations ranging from 5 to 15 mTorr. The maps suggest that the changes in working pressure did not affect the sheet resistance of the thin film significantly. The working pressure of 10 mTorr contributed to the highest average sheet resistance and was identified as having a larger sheet resistance uniformity area in the center of the sample. In the same manner as the sheet resistance, the transmittance of the FTO film coated on PET was not really dependent on the changes in the working pressure of the apparatus; in this case, the transmittance was similar (approximately 90%) as shown in Figure 3b.


Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films.

Hudaya C, Park JH, Lee JK - Nanoscale Res Lett (2012)

Contour maps of an FTO thin film on a PET substrate for working pressure variations. The working pressures were varied at (a) 5 mTorr, (b) 7.5 mTorr, (c) 10 mTorr, (d) 12.5 mTorr, and (e) 15 mTorr. (f) The sheet resistance uniformity and figure of merit of the FTO thin film under working pressure variations.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3275492&req=5

Figure 4: Contour maps of an FTO thin film on a PET substrate for working pressure variations. The working pressures were varied at (a) 5 mTorr, (b) 7.5 mTorr, (c) 10 mTorr, (d) 12.5 mTorr, and (e) 15 mTorr. (f) The sheet resistance uniformity and figure of merit of the FTO thin film under working pressure variations.
Mentions: Figure 4a to 4e show the contour maps for the experiments examining the working pressure variations ranging from 5 to 15 mTorr. The maps suggest that the changes in working pressure did not affect the sheet resistance of the thin film significantly. The working pressure of 10 mTorr contributed to the highest average sheet resistance and was identified as having a larger sheet resistance uniformity area in the center of the sample. In the same manner as the sheet resistance, the transmittance of the FTO film coated on PET was not really dependent on the changes in the working pressure of the apparatus; in this case, the transmittance was similar (approximately 90%) as shown in Figure 3b.

Bottom Line: Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity.Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated.The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

View Article: PubMed Central - HTML - PubMed

Affiliation: Advanced Energy Materials Processing Laboratory, Energy Storage Research Center, Korea Institute of Science and Technology, Hwarangno 14 gil 5, Seongbuk-gu, Seoul, 136-791, Republic of Korea. leejk@kist.re.kr.

ABSTRACT
An alternative indium-free material for transparent conducting oxides of fluorine-doped tin oxide [FTO] thin films deposited on polyethylene terephthalate [PET] was prepared by electron cyclotron resonance - metal organic chemical vapor deposition [ECR-MOCVD]. One of the essential issues regarding metal oxide film deposition is the sheet resistance uniformity of the film. Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity. Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated. The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

No MeSH data available.


Related in: MedlinePlus