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Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films.

Hudaya C, Park JH, Lee JK - Nanoscale Res Lett (2012)

Bottom Line: Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity.Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated.The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

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Affiliation: Advanced Energy Materials Processing Laboratory, Energy Storage Research Center, Korea Institute of Science and Technology, Hwarangno 14 gil 5, Seongbuk-gu, Seoul, 136-791, Republic of Korea. leejk@kist.re.kr.

ABSTRACT
An alternative indium-free material for transparent conducting oxides of fluorine-doped tin oxide [FTO] thin films deposited on polyethylene terephthalate [PET] was prepared by electron cyclotron resonance - metal organic chemical vapor deposition [ECR-MOCVD]. One of the essential issues regarding metal oxide film deposition is the sheet resistance uniformity of the film. Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity. Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated. The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

No MeSH data available.


The optical transmittance of an FTO thin film coated on a PET substrate. Optical transmittance for (a) bubbler pressure variations and (b) working pressure variations.
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Figure 3: The optical transmittance of an FTO thin film coated on a PET substrate. Optical transmittance for (a) bubbler pressure variations and (b) working pressure variations.

Mentions: In terms of the optical properties, we found that the increasing bubbler pressure affected the slightly higher film transmittance as shown in Figure 3a. At a wavelength of 550 nm, the transmittances of 40.2 and 60 Torr were 82.85% and 91.26%, respectively while the other transmittances of bubbler pressure variations were in between. This situation follows the figure of merits as described in Equation 1; hence, one has to compromise the two parameters in order to obtain the appropriate TCO materials.


Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films.

Hudaya C, Park JH, Lee JK - Nanoscale Res Lett (2012)

The optical transmittance of an FTO thin film coated on a PET substrate. Optical transmittance for (a) bubbler pressure variations and (b) working pressure variations.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3275492&req=5

Figure 3: The optical transmittance of an FTO thin film coated on a PET substrate. Optical transmittance for (a) bubbler pressure variations and (b) working pressure variations.
Mentions: In terms of the optical properties, we found that the increasing bubbler pressure affected the slightly higher film transmittance as shown in Figure 3a. At a wavelength of 550 nm, the transmittances of 40.2 and 60 Torr were 82.85% and 91.26%, respectively while the other transmittances of bubbler pressure variations were in between. This situation follows the figure of merits as described in Equation 1; hence, one has to compromise the two parameters in order to obtain the appropriate TCO materials.

Bottom Line: Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity.Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated.The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

View Article: PubMed Central - HTML - PubMed

Affiliation: Advanced Energy Materials Processing Laboratory, Energy Storage Research Center, Korea Institute of Science and Technology, Hwarangno 14 gil 5, Seongbuk-gu, Seoul, 136-791, Republic of Korea. leejk@kist.re.kr.

ABSTRACT
An alternative indium-free material for transparent conducting oxides of fluorine-doped tin oxide [FTO] thin films deposited on polyethylene terephthalate [PET] was prepared by electron cyclotron resonance - metal organic chemical vapor deposition [ECR-MOCVD]. One of the essential issues regarding metal oxide film deposition is the sheet resistance uniformity of the film. Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity. Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated. The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

No MeSH data available.