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Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films.

Hudaya C, Park JH, Lee JK - Nanoscale Res Lett (2012)

Bottom Line: Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity.Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated.The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

View Article: PubMed Central - HTML - PubMed

Affiliation: Advanced Energy Materials Processing Laboratory, Energy Storage Research Center, Korea Institute of Science and Technology, Hwarangno 14 gil 5, Seongbuk-gu, Seoul, 136-791, Republic of Korea. leejk@kist.re.kr.

ABSTRACT
An alternative indium-free material for transparent conducting oxides of fluorine-doped tin oxide [FTO] thin films deposited on polyethylene terephthalate [PET] was prepared by electron cyclotron resonance - metal organic chemical vapor deposition [ECR-MOCVD]. One of the essential issues regarding metal oxide film deposition is the sheet resistance uniformity of the film. Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity. Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated. The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

No MeSH data available.


Related in: MedlinePlus

Contour maps of an FTO thin film on a PET substrate for bubbler pressure variations. The bubbler pressures were varied at (a) 40.2 Torr, (b) 43.2 Torr, (c) 45.7 Torr, (d) 55 Torr, (e) 60.2 Torr. (f) The sheet resistance uniformity and figure of merit of the FTO thin film under bubbler pressure variations.
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Figure 2: Contour maps of an FTO thin film on a PET substrate for bubbler pressure variations. The bubbler pressures were varied at (a) 40.2 Torr, (b) 43.2 Torr, (c) 45.7 Torr, (d) 55 Torr, (e) 60.2 Torr. (f) The sheet resistance uniformity and figure of merit of the FTO thin film under bubbler pressure variations.

Mentions: Figures 2a to 2e show the contour of the sheet resistance uniformity of each bubbler pressure variation of 40.2, 43.3, 45.7, 55, and 60.6 Torr, respectively. The contour maps illustrate the regions where the sheet resistances of each bubbler pressure variation are mapped. The maps show the uniformity patterns that are formed in parallel with the y-axis obviously due to the application of a rolling system as a substrate holder in the ECR-MOCVD apparatus. The sheet resistance uniformity is likely to be present at the center of the coated PET substrate indicated by the larger areas with the same color. These phenomena were also confirmed by previous researchers [11].


Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films.

Hudaya C, Park JH, Lee JK - Nanoscale Res Lett (2012)

Contour maps of an FTO thin film on a PET substrate for bubbler pressure variations. The bubbler pressures were varied at (a) 40.2 Torr, (b) 43.2 Torr, (c) 45.7 Torr, (d) 55 Torr, (e) 60.2 Torr. (f) The sheet resistance uniformity and figure of merit of the FTO thin film under bubbler pressure variations.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3275492&req=5

Figure 2: Contour maps of an FTO thin film on a PET substrate for bubbler pressure variations. The bubbler pressures were varied at (a) 40.2 Torr, (b) 43.2 Torr, (c) 45.7 Torr, (d) 55 Torr, (e) 60.2 Torr. (f) The sheet resistance uniformity and figure of merit of the FTO thin film under bubbler pressure variations.
Mentions: Figures 2a to 2e show the contour of the sheet resistance uniformity of each bubbler pressure variation of 40.2, 43.3, 45.7, 55, and 60.6 Torr, respectively. The contour maps illustrate the regions where the sheet resistances of each bubbler pressure variation are mapped. The maps show the uniformity patterns that are formed in parallel with the y-axis obviously due to the application of a rolling system as a substrate holder in the ECR-MOCVD apparatus. The sheet resistance uniformity is likely to be present at the center of the coated PET substrate indicated by the larger areas with the same color. These phenomena were also confirmed by previous researchers [11].

Bottom Line: Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity.Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated.The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

View Article: PubMed Central - HTML - PubMed

Affiliation: Advanced Energy Materials Processing Laboratory, Energy Storage Research Center, Korea Institute of Science and Technology, Hwarangno 14 gil 5, Seongbuk-gu, Seoul, 136-791, Republic of Korea. leejk@kist.re.kr.

ABSTRACT
An alternative indium-free material for transparent conducting oxides of fluorine-doped tin oxide [FTO] thin films deposited on polyethylene terephthalate [PET] was prepared by electron cyclotron resonance - metal organic chemical vapor deposition [ECR-MOCVD]. One of the essential issues regarding metal oxide film deposition is the sheet resistance uniformity of the film. Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity. Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated. The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

No MeSH data available.


Related in: MedlinePlus