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Simultaneous fabrication of line defects-embedded periodic lattice by topographically assisted holographic lithography.

Choi BY, Pak Y, Kim KS, Lee KH, Jung GY - Nanoscale Res Lett (2011)

Bottom Line: For rapid fabrication of periodic structures incorporating nanoscale line-defects at large area, topographically assisted holographic lithography (TAHL) technique, combining the strength of hologram lithography and phase-shift interference, was proposed.Embossing temperature and relief height were crucial parameters for the successful TAHL process.Periodic holes with a diameter of 600 nm at a 1 μm-pitch incorporating 250 nm wide line-defects were obtained simultaneously.

View Article: PubMed Central - HTML - PubMed

Affiliation: Department of Materials Science and Engineering Gwangju Institute of Science and Technology (GIST), 261 Cheomdan-gwagiro, Buk-gu, Gwangju 500-712, Republic of Korea. gyjung@gist.ac.kr.

ABSTRACT
We have demonstrated simultaneous fabrication of designed defects within a periodic structure. For rapid fabrication of periodic structures incorporating nanoscale line-defects at large area, topographically assisted holographic lithography (TAHL) technique, combining the strength of hologram lithography and phase-shift interference, was proposed. Hot-embossing method generated the photoresist patterns with vertical side walls which enabled phase-shift mask effect at the edge of patterns. Embossing temperature and relief height were crucial parameters for the successful TAHL process. Periodic holes with a diameter of 600 nm at a 1 μm-pitch incorporating 250 nm wide line-defects were obtained simultaneously.

No MeSH data available.


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Hologram lithography. (a) Experimental set-up of hologram lithography. (b) FE-SEM images of PR lines fabricated by single exposure and (c) periodic PR holes fabricated by double exposure.
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Figure 1: Hologram lithography. (a) Experimental set-up of hologram lithography. (b) FE-SEM images of PR lines fabricated by single exposure and (c) periodic PR holes fabricated by double exposure.

Mentions: Hologram lithography was adopted in this study to generate periodic structure in addition to its outstanding merits, e.g., easy and fast processing, large-area patterning and easy density modulation. Figure 1a illustrates our setup of the holographic lithography with a 325 nm He-Cd laser. The laser beam passed through two consecutive mirrors (1, 2), a spatial filter and finally a pinhole, by which waves were diffracted; the diffracted waves were then propagated toward the sample and a Lloyd mirror. The beam reflected at the Lloyd mirror interfered with the beam directly projected onto the sample at certain incident angle (θ), generating sinusoidal intensity distribution on the PR according to the following equation; P = λ/2sinθ, where P equals the pitch or lattice constant of a periodic pattern, and λ is the laser wavelength. Figure 1b illustrates 650 nm wide periodic PR lines at a 1 μm pitch fabricated by single exposure with an incident angle of 9.35°. Figure 1c demonstrates periodic PR holes with a diameter of 250 nm at a 600 nm pitch fabricated by double exposure; after first exposure, the sample was rotated by 90°, the second exposure was then performed with an incident angle of 15.72°. Patterns were uniformly generated in up to 2-in. wafer.


Simultaneous fabrication of line defects-embedded periodic lattice by topographically assisted holographic lithography.

Choi BY, Pak Y, Kim KS, Lee KH, Jung GY - Nanoscale Res Lett (2011)

Hologram lithography. (a) Experimental set-up of hologram lithography. (b) FE-SEM images of PR lines fabricated by single exposure and (c) periodic PR holes fabricated by double exposure.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3211868&req=5

Figure 1: Hologram lithography. (a) Experimental set-up of hologram lithography. (b) FE-SEM images of PR lines fabricated by single exposure and (c) periodic PR holes fabricated by double exposure.
Mentions: Hologram lithography was adopted in this study to generate periodic structure in addition to its outstanding merits, e.g., easy and fast processing, large-area patterning and easy density modulation. Figure 1a illustrates our setup of the holographic lithography with a 325 nm He-Cd laser. The laser beam passed through two consecutive mirrors (1, 2), a spatial filter and finally a pinhole, by which waves were diffracted; the diffracted waves were then propagated toward the sample and a Lloyd mirror. The beam reflected at the Lloyd mirror interfered with the beam directly projected onto the sample at certain incident angle (θ), generating sinusoidal intensity distribution on the PR according to the following equation; P = λ/2sinθ, where P equals the pitch or lattice constant of a periodic pattern, and λ is the laser wavelength. Figure 1b illustrates 650 nm wide periodic PR lines at a 1 μm pitch fabricated by single exposure with an incident angle of 9.35°. Figure 1c demonstrates periodic PR holes with a diameter of 250 nm at a 600 nm pitch fabricated by double exposure; after first exposure, the sample was rotated by 90°, the second exposure was then performed with an incident angle of 15.72°. Patterns were uniformly generated in up to 2-in. wafer.

Bottom Line: For rapid fabrication of periodic structures incorporating nanoscale line-defects at large area, topographically assisted holographic lithography (TAHL) technique, combining the strength of hologram lithography and phase-shift interference, was proposed.Embossing temperature and relief height were crucial parameters for the successful TAHL process.Periodic holes with a diameter of 600 nm at a 1 μm-pitch incorporating 250 nm wide line-defects were obtained simultaneously.

View Article: PubMed Central - HTML - PubMed

Affiliation: Department of Materials Science and Engineering Gwangju Institute of Science and Technology (GIST), 261 Cheomdan-gwagiro, Buk-gu, Gwangju 500-712, Republic of Korea. gyjung@gist.ac.kr.

ABSTRACT
We have demonstrated simultaneous fabrication of designed defects within a periodic structure. For rapid fabrication of periodic structures incorporating nanoscale line-defects at large area, topographically assisted holographic lithography (TAHL) technique, combining the strength of hologram lithography and phase-shift interference, was proposed. Hot-embossing method generated the photoresist patterns with vertical side walls which enabled phase-shift mask effect at the edge of patterns. Embossing temperature and relief height were crucial parameters for the successful TAHL process. Periodic holes with a diameter of 600 nm at a 1 μm-pitch incorporating 250 nm wide line-defects were obtained simultaneously.

No MeSH data available.


Related in: MedlinePlus