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Fabrication of ultrahigh-density nanowires by electrochemical nanolithography.

Chen F, Jiang H, Kiefer AM, Clausen AM, Ting YH, Wendt AE, Ding B, Lagally MG - Nanoscale Res Lett (2011)

Bottom Line: An approach has been developed to produce silver nanoparticles (AgNPs) rapidly on semiconductor wafers using electrochemical deposition.The closely packed AgNPs have a density of up to 1.4 × 1011 cm-2 with good size uniformity.AgNPs retain their shape and position on the substrate when used as nanomasks for producing ultrahigh-density vertical nanowire arrays with controllable size, making it a one-step nanolithography technique.

View Article: PubMed Central - HTML - PubMed

Affiliation: University of Wisconsin-Madison, Madison, WI 53706, USA. lagally@engr.wisc.edu.

ABSTRACT
An approach has been developed to produce silver nanoparticles (AgNPs) rapidly on semiconductor wafers using electrochemical deposition. The closely packed AgNPs have a density of up to 1.4 × 1011 cm-2 with good size uniformity. AgNPs retain their shape and position on the substrate when used as nanomasks for producing ultrahigh-density vertical nanowire arrays with controllable size, making it a one-step nanolithography technique. We demonstrate this method on Si/SiGe multilayer superlattices using electrochemical nanopatterning and plasma etching to obtain high-density Si/SiGe multilayer superlattice nanowires.

No MeSH data available.


Related in: MedlinePlus

Ag nanoparticle size and coverage as a function of immersion time. Ag nanoparticle (a) size and (b) coverage as a function of immersion time. Symbols are experimental values; solid lines are prediction.
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Figure 4: Ag nanoparticle size and coverage as a function of immersion time. Ag nanoparticle (a) size and (b) coverage as a function of immersion time. Symbols are experimental values; solid lines are prediction.

Mentions: Inserting the experimental pulse length τ = 0.5 s into Equation 2 and Equation 3, we can plot the size of the particles and the coverage of the substrate as functions of the immersion time, as shown in Figure 4a,b, respectively. The most common particle size agrees with theory very well (Figure 4a). However, the average particle size is larger than the most common particle size, indicating variation in the shape of the AgNPs in the ECD. When the immersion time is short, the particles are crowns instead of hemispherical. As the immersion time increases, the height of the particle increases, and this shape change results in the experimental coverage getting closer to the theory curve, in which we assume the particles to be perfect hemispheres, as shown in Figure 4b. The NPs will finally turn into a continuous film if a long enough immersion time is used [30].


Fabrication of ultrahigh-density nanowires by electrochemical nanolithography.

Chen F, Jiang H, Kiefer AM, Clausen AM, Ting YH, Wendt AE, Ding B, Lagally MG - Nanoscale Res Lett (2011)

Ag nanoparticle size and coverage as a function of immersion time. Ag nanoparticle (a) size and (b) coverage as a function of immersion time. Symbols are experimental values; solid lines are prediction.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3211863&req=5

Figure 4: Ag nanoparticle size and coverage as a function of immersion time. Ag nanoparticle (a) size and (b) coverage as a function of immersion time. Symbols are experimental values; solid lines are prediction.
Mentions: Inserting the experimental pulse length τ = 0.5 s into Equation 2 and Equation 3, we can plot the size of the particles and the coverage of the substrate as functions of the immersion time, as shown in Figure 4a,b, respectively. The most common particle size agrees with theory very well (Figure 4a). However, the average particle size is larger than the most common particle size, indicating variation in the shape of the AgNPs in the ECD. When the immersion time is short, the particles are crowns instead of hemispherical. As the immersion time increases, the height of the particle increases, and this shape change results in the experimental coverage getting closer to the theory curve, in which we assume the particles to be perfect hemispheres, as shown in Figure 4b. The NPs will finally turn into a continuous film if a long enough immersion time is used [30].

Bottom Line: An approach has been developed to produce silver nanoparticles (AgNPs) rapidly on semiconductor wafers using electrochemical deposition.The closely packed AgNPs have a density of up to 1.4 × 1011 cm-2 with good size uniformity.AgNPs retain their shape and position on the substrate when used as nanomasks for producing ultrahigh-density vertical nanowire arrays with controllable size, making it a one-step nanolithography technique.

View Article: PubMed Central - HTML - PubMed

Affiliation: University of Wisconsin-Madison, Madison, WI 53706, USA. lagally@engr.wisc.edu.

ABSTRACT
An approach has been developed to produce silver nanoparticles (AgNPs) rapidly on semiconductor wafers using electrochemical deposition. The closely packed AgNPs have a density of up to 1.4 × 1011 cm-2 with good size uniformity. AgNPs retain their shape and position on the substrate when used as nanomasks for producing ultrahigh-density vertical nanowire arrays with controllable size, making it a one-step nanolithography technique. We demonstrate this method on Si/SiGe multilayer superlattices using electrochemical nanopatterning and plasma etching to obtain high-density Si/SiGe multilayer superlattice nanowires.

No MeSH data available.


Related in: MedlinePlus