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Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering.

Pinto SR, Rolo AG, Buljan M, Chahboun A, Bernstorff S, Barradas NP, Alves E, Kashtiban RJ, Bangert U, Gomes MJ - Nanoscale Res Lett (2011)

Bottom Line: In this article, we present an investigation of (Ge + SiO2)/SiO2 multilayers deposited by magnetron sputtering and subsequently annealed at different temperatures.The clusters are ordered in a three-dimensional lattice, and they have very small sizes (about 3 nm) and narrow size distribution.The crystallization of the clusters was achieved at annealing temperature of 700°C.

View Article: PubMed Central - HTML - PubMed

Affiliation: Physics Department, University of Minho, 4710-057 Braga, Portugal. sarapinto@fisica.uminho.pt.

ABSTRACT
In this article, we present an investigation of (Ge + SiO2)/SiO2 multilayers deposited by magnetron sputtering and subsequently annealed at different temperatures. The structural properties were investigated by transmission electron microscopy, grazing incidence small angles X-ray scattering, Rutherford backscattering spectrometry, Raman, and X-ray photoelectron spectroscopies. We show a formation of self-assembled Ge clusters during the deposition at 250°C. The clusters are ordered in a three-dimensional lattice, and they have very small sizes (about 3 nm) and narrow size distribution. The crystallization of the clusters was achieved at annealing temperature of 700°C.

No MeSH data available.


Related in: MedlinePlus

HRTEM cross-sectional images of the as-deposited multilayer, depicted in various magnifications. The regularity in the cluster positions is indicated by arrows. In some clusters (inset) crystallization of the deposited material is visible.
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Figure 2: HRTEM cross-sectional images of the as-deposited multilayer, depicted in various magnifications. The regularity in the cluster positions is indicated by arrows. In some clusters (inset) crystallization of the deposited material is visible.

Mentions: HRTEM was employed to explore the structure of the as-grown multilayers. Figure 2 shows a bright-field cross-sectional TEM image of the as-deposited multilayer sample, with different magnifications. In Figure 2a, dark dots are seen on the oxide matrix corresponding to the clusters formed, due to their higher material density. As a result of the two-dimensional projection of a three-dimensional sample, some of the layers appear to be continuous. The image with the higher magnification (Figure 2b) shows that the clusters are well separated and nearly spherical in shape. Some regularity in the nanocluster positions may be noticed (Figure 2a), but spatial correlations are much better visible in the reciprocal space, which will be shown later. Some of the as-grown clusters show a crystalline phase as illustrated in the inset of Figure 2b. This demonstrates that the as-grown sample at 250°C already contained some crystalline particles. However, more HRTEM observations are under progress to shed light on the nature (crystalline/amorphous) of the nanoparticles. The average size of particles found by HRTEM images was approximately 3 nm.


Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering.

Pinto SR, Rolo AG, Buljan M, Chahboun A, Bernstorff S, Barradas NP, Alves E, Kashtiban RJ, Bangert U, Gomes MJ - Nanoscale Res Lett (2011)

HRTEM cross-sectional images of the as-deposited multilayer, depicted in various magnifications. The regularity in the cluster positions is indicated by arrows. In some clusters (inset) crystallization of the deposited material is visible.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3211430&req=5

Figure 2: HRTEM cross-sectional images of the as-deposited multilayer, depicted in various magnifications. The regularity in the cluster positions is indicated by arrows. In some clusters (inset) crystallization of the deposited material is visible.
Mentions: HRTEM was employed to explore the structure of the as-grown multilayers. Figure 2 shows a bright-field cross-sectional TEM image of the as-deposited multilayer sample, with different magnifications. In Figure 2a, dark dots are seen on the oxide matrix corresponding to the clusters formed, due to their higher material density. As a result of the two-dimensional projection of a three-dimensional sample, some of the layers appear to be continuous. The image with the higher magnification (Figure 2b) shows that the clusters are well separated and nearly spherical in shape. Some regularity in the nanocluster positions may be noticed (Figure 2a), but spatial correlations are much better visible in the reciprocal space, which will be shown later. Some of the as-grown clusters show a crystalline phase as illustrated in the inset of Figure 2b. This demonstrates that the as-grown sample at 250°C already contained some crystalline particles. However, more HRTEM observations are under progress to shed light on the nature (crystalline/amorphous) of the nanoparticles. The average size of particles found by HRTEM images was approximately 3 nm.

Bottom Line: In this article, we present an investigation of (Ge + SiO2)/SiO2 multilayers deposited by magnetron sputtering and subsequently annealed at different temperatures.The clusters are ordered in a three-dimensional lattice, and they have very small sizes (about 3 nm) and narrow size distribution.The crystallization of the clusters was achieved at annealing temperature of 700°C.

View Article: PubMed Central - HTML - PubMed

Affiliation: Physics Department, University of Minho, 4710-057 Braga, Portugal. sarapinto@fisica.uminho.pt.

ABSTRACT
In this article, we present an investigation of (Ge + SiO2)/SiO2 multilayers deposited by magnetron sputtering and subsequently annealed at different temperatures. The structural properties were investigated by transmission electron microscopy, grazing incidence small angles X-ray scattering, Rutherford backscattering spectrometry, Raman, and X-ray photoelectron spectroscopies. We show a formation of self-assembled Ge clusters during the deposition at 250°C. The clusters are ordered in a three-dimensional lattice, and they have very small sizes (about 3 nm) and narrow size distribution. The crystallization of the clusters was achieved at annealing temperature of 700°C.

No MeSH data available.


Related in: MedlinePlus