Limits...
Micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large area.

Kim BS, Shin S, Shin SJ, Kim KM, Cho HH - Nanoscale Res Lett (2011)

Bottom Line: The fabrication process is readily capable of producing MNHS covering a wafer-scale area.By controlling the removal of polymeric passivation layers deposited during silicon dry etching (Bosch process), we can control the geometries for the hierarchical structure with or without the thin hydrophobic barriers that affect surface wettability.MNHS without sidewalls exhibit superhydrophilic behavior with a contact angle under 10°, whereas those with sidewalls preserved by the passivation layer display more hydrophobic characteristics with a contact angle near 60°.

View Article: PubMed Central - HTML - PubMed

Affiliation: Department of Mechanical Engineering, Yonsei University, 262, Seongsanno, Seodaemun-gu, Seoul 120-749, Korea. hhcho@yonsei.ac.kr.

ABSTRACT
Nanoscale surface manipulation technique to control the surface roughness and the wettability is a challenging field for performance enhancement in boiling heat transfer. In this study, micro-nano hybrid structures (MNHS) with hierarchical geometries that lead to maximizing of surface area, roughness, and wettability are developed for the boiling applications. MNHS structures consist of micropillars or microcavities along with nanowires having the length to diameter ratio of about 100:1. MNHS is fabricated by a two-step silicon etching process, which are dry etching for micropattern and electroless silicon wet etching for nanowire synthesis. The fabrication process is readily capable of producing MNHS covering a wafer-scale area. By controlling the removal of polymeric passivation layers deposited during silicon dry etching (Bosch process), we can control the geometries for the hierarchical structure with or without the thin hydrophobic barriers that affect surface wettability. MNHS without sidewalls exhibit superhydrophilic behavior with a contact angle under 10°, whereas those with sidewalls preserved by the passivation layer display more hydrophobic characteristics with a contact angle near 60°.

No MeSH data available.


Related in: MedlinePlus

Schematics of pillar structures on a substrate: (a) top-view; (b) side-view.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
getmorefigures.php?uid=PMC3211421&req=5

Figure 6: Schematics of pillar structures on a substrate: (a) top-view; (b) side-view.

Mentions: In this study, for the bare Si substrate which shows a hydrophilic behavior with contact angle less than 90° (θavg = 70.1° like Figure 6a in the manuscript), surface wettability could be explained by Wenzel's relationship. Considering surface roughness by the geometrical characteristics, contact angle on the surface could be described by the following equation from reference of:(1)


Micro-nano hybrid structures with manipulated wettability using a two-step silicon etching on a large area.

Kim BS, Shin S, Shin SJ, Kim KM, Cho HH - Nanoscale Res Lett (2011)

Schematics of pillar structures on a substrate: (a) top-view; (b) side-view.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3211421&req=5

Figure 6: Schematics of pillar structures on a substrate: (a) top-view; (b) side-view.
Mentions: In this study, for the bare Si substrate which shows a hydrophilic behavior with contact angle less than 90° (θavg = 70.1° like Figure 6a in the manuscript), surface wettability could be explained by Wenzel's relationship. Considering surface roughness by the geometrical characteristics, contact angle on the surface could be described by the following equation from reference of:(1)

Bottom Line: The fabrication process is readily capable of producing MNHS covering a wafer-scale area.By controlling the removal of polymeric passivation layers deposited during silicon dry etching (Bosch process), we can control the geometries for the hierarchical structure with or without the thin hydrophobic barriers that affect surface wettability.MNHS without sidewalls exhibit superhydrophilic behavior with a contact angle under 10°, whereas those with sidewalls preserved by the passivation layer display more hydrophobic characteristics with a contact angle near 60°.

View Article: PubMed Central - HTML - PubMed

Affiliation: Department of Mechanical Engineering, Yonsei University, 262, Seongsanno, Seodaemun-gu, Seoul 120-749, Korea. hhcho@yonsei.ac.kr.

ABSTRACT
Nanoscale surface manipulation technique to control the surface roughness and the wettability is a challenging field for performance enhancement in boiling heat transfer. In this study, micro-nano hybrid structures (MNHS) with hierarchical geometries that lead to maximizing of surface area, roughness, and wettability are developed for the boiling applications. MNHS structures consist of micropillars or microcavities along with nanowires having the length to diameter ratio of about 100:1. MNHS is fabricated by a two-step silicon etching process, which are dry etching for micropattern and electroless silicon wet etching for nanowire synthesis. The fabrication process is readily capable of producing MNHS covering a wafer-scale area. By controlling the removal of polymeric passivation layers deposited during silicon dry etching (Bosch process), we can control the geometries for the hierarchical structure with or without the thin hydrophobic barriers that affect surface wettability. MNHS without sidewalls exhibit superhydrophilic behavior with a contact angle under 10°, whereas those with sidewalls preserved by the passivation layer display more hydrophobic characteristics with a contact angle near 60°.

No MeSH data available.


Related in: MedlinePlus