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Characterization of Films with Thickness Less than 10 nm by Sensitivity-Enhanced Atomic Force Acoustic Microscopy

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ABSTRACT

We present a method for characterizing ultrathin films using sensitivity-enhanced atomic force acoustic microscopy, where a concentrated-mass cantilever having a flat tip was used as a sensitive oscillator. Evaluation was aimed at 6-nm-thick and 10-nm-thick diamond-like carbon (DLC) films deposited, using different methods, on a hard disk for the effective Young's modulus defined as E/(1 - ν2), where E is the Young's modulus, and ν is the Poisson's ratio. The resonant frequency of the cantilever was affected not only by the film's elasticity but also by the substrate even at an indentation depth of about 0.6 nm. The substrate effect was removed by employing a theoretical formula on the indentation of a layered half-space, together with a hard disk without DLC coating. The moduli of the 6-nm-thick and 10-nm-thick DLC films were 392 and 345 GPa, respectively. The error analysis showed the standard deviation less than 5% in the moduli.

No MeSH data available.


The spectra of the CM cantilever vibration in contact with silicon (100) when increasing the contact force (Fe).
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Figure 3: The spectra of the CM cantilever vibration in contact with silicon (100) when increasing the contact force (Fe).

Mentions: The CM cantilever in free space measured f0 = 9.917 kHz for the fundamental resonant frequency. Figure 3 shows spectra for the reference, Si (100) wafer. The resonant frequency seems to become independent of the contact force (Fe) when increasing Fe. This reflects the constant contact area observed in the case of the flat tip.


Characterization of Films with Thickness Less than 10 nm by Sensitivity-Enhanced Atomic Force Acoustic Microscopy
The spectra of the CM cantilever vibration in contact with silicon (100) when increasing the contact force (Fe).
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3211417&req=5

Figure 3: The spectra of the CM cantilever vibration in contact with silicon (100) when increasing the contact force (Fe).
Mentions: The CM cantilever in free space measured f0 = 9.917 kHz for the fundamental resonant frequency. Figure 3 shows spectra for the reference, Si (100) wafer. The resonant frequency seems to become independent of the contact force (Fe) when increasing Fe. This reflects the constant contact area observed in the case of the flat tip.

View Article: PubMed Central - HTML - PubMed

ABSTRACT

We present a method for characterizing ultrathin films using sensitivity-enhanced atomic force acoustic microscopy, where a concentrated-mass cantilever having a flat tip was used as a sensitive oscillator. Evaluation was aimed at 6-nm-thick and 10-nm-thick diamond-like carbon (DLC) films deposited, using different methods, on a hard disk for the effective Young's modulus defined as E/(1 - ν2), where E is the Young's modulus, and ν is the Poisson's ratio. The resonant frequency of the cantilever was affected not only by the film's elasticity but also by the substrate even at an indentation depth of about 0.6 nm. The substrate effect was removed by employing a theoretical formula on the indentation of a layered half-space, together with a hard disk without DLC coating. The moduli of the 6-nm-thick and 10-nm-thick DLC films were 392 and 345 GPa, respectively. The error analysis showed the standard deviation less than 5% in the moduli.

No MeSH data available.