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Anisotropic TixSn1-xO2 nanostructures prepared by magnetron sputter deposition.

Chen S, Li Z, Zhang Z - Nanoscale Res Lett (2011)

Bottom Line: Regular arrays of TixSn1-xO2 nanoflakes were fabricated through glancing angle sputter deposition onto self-assembled close-packed arrays of 200-nm-diameter polystyrene spheres.The reflectance measurements showed that the melon seed-shaped nanoflakes exhibited optimal properties of antireflection in the entire visible and ultraviolet region.In addition, we determined their anisotropic reflectance in the direction parallel to the surface of nanoflakes and perpendicular to it, arising from the anisotropic morphology.

View Article: PubMed Central - HTML - PubMed

Affiliation: State Key Laboratory of New Ceramic and Fine Processing, Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, China. zcli@tsinghua.edu.cn.

ABSTRACT
Regular arrays of TixSn1-xO2 nanoflakes were fabricated through glancing angle sputter deposition onto self-assembled close-packed arrays of 200-nm-diameter polystyrene spheres. The morphology of nanostructures could be controlled by simply adjusting the sputtering power of the Ti target. The reflectance measurements showed that the melon seed-shaped nanoflakes exhibited optimal properties of antireflection in the entire visible and ultraviolet region. In addition, we determined their anisotropic reflectance in the direction parallel to the surface of nanoflakes and perpendicular to it, arising from the anisotropic morphology.

No MeSH data available.


The length-width ratio of nanostructures versus the thickness of corresponding Ti films.
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Figure 4: The length-width ratio of nanostructures versus the thickness of corresponding Ti films.

Mentions: To investigate the relationship of the sputtering rate with the shape of nanostructures, the depositions of Ti films were carried out, with the discharge currents set to 0.15, 0.20, and 0.25 A, respectively, and other conditions consistent with the depositions of TixSn1-xO2. The thicknesses of the prepared Ti films for the three specimens are 42.3, 74.4, and 91.2 nm, respectively, measured through the SEM micrographs (the resolution of the applied scanning electron microscope is 2.0 nm). Because the thickness of the Ti films is directly proportional to the sputtering rate of the Ti target with other factors being held constant, the question can be transformed to the relationship of the thickness of Ti films with the length-width ratio of nanoflakes, as illustrated in Figure 4. This result confirms that the average length-width ratio of the nanostructures holds a linear relationship with the thickness of the Ti films, suggesting the linear dependence of the length-width ratio on the sputtering rate of Ti target. Accordingly, the morphology of the nanostructures can be modulated by regulating the sputtering power of Ti target.


Anisotropic TixSn1-xO2 nanostructures prepared by magnetron sputter deposition.

Chen S, Li Z, Zhang Z - Nanoscale Res Lett (2011)

The length-width ratio of nanostructures versus the thickness of corresponding Ti films.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3211414&req=5

Figure 4: The length-width ratio of nanostructures versus the thickness of corresponding Ti films.
Mentions: To investigate the relationship of the sputtering rate with the shape of nanostructures, the depositions of Ti films were carried out, with the discharge currents set to 0.15, 0.20, and 0.25 A, respectively, and other conditions consistent with the depositions of TixSn1-xO2. The thicknesses of the prepared Ti films for the three specimens are 42.3, 74.4, and 91.2 nm, respectively, measured through the SEM micrographs (the resolution of the applied scanning electron microscope is 2.0 nm). Because the thickness of the Ti films is directly proportional to the sputtering rate of the Ti target with other factors being held constant, the question can be transformed to the relationship of the thickness of Ti films with the length-width ratio of nanoflakes, as illustrated in Figure 4. This result confirms that the average length-width ratio of the nanostructures holds a linear relationship with the thickness of the Ti films, suggesting the linear dependence of the length-width ratio on the sputtering rate of Ti target. Accordingly, the morphology of the nanostructures can be modulated by regulating the sputtering power of Ti target.

Bottom Line: Regular arrays of TixSn1-xO2 nanoflakes were fabricated through glancing angle sputter deposition onto self-assembled close-packed arrays of 200-nm-diameter polystyrene spheres.The reflectance measurements showed that the melon seed-shaped nanoflakes exhibited optimal properties of antireflection in the entire visible and ultraviolet region.In addition, we determined their anisotropic reflectance in the direction parallel to the surface of nanoflakes and perpendicular to it, arising from the anisotropic morphology.

View Article: PubMed Central - HTML - PubMed

Affiliation: State Key Laboratory of New Ceramic and Fine Processing, Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, China. zcli@tsinghua.edu.cn.

ABSTRACT
Regular arrays of TixSn1-xO2 nanoflakes were fabricated through glancing angle sputter deposition onto self-assembled close-packed arrays of 200-nm-diameter polystyrene spheres. The morphology of nanostructures could be controlled by simply adjusting the sputtering power of the Ti target. The reflectance measurements showed that the melon seed-shaped nanoflakes exhibited optimal properties of antireflection in the entire visible and ultraviolet region. In addition, we determined their anisotropic reflectance in the direction parallel to the surface of nanoflakes and perpendicular to it, arising from the anisotropic morphology.

No MeSH data available.