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Memory properties and charge effect study in Si nanocrystals by scanning capacitance microscopy and spectroscopy.

Lin Z, Bremond G, Bassani F - Nanoscale Res Lett (2011)

Bottom Line: Scanning capacitance microscopy and spectroscopy were used to study the memory properties and charge effect in the Si nanocrystal in ambient temperature.The DC spectra curve shift direction and distance was observed differently for quantitative measurements.Holes or electrons can be separately injected into these Si-ncs and the capacitance changes caused by these trapped charges can be easily detected by scanning capacitance microscopy/spectroscopy at the nanometer scale.

View Article: PubMed Central - HTML - PubMed

Affiliation: Institut des Nanotechnologies de Lyon, UMR 5270, Institut National des Sciences Appliquées de Lyon, Université de Lyon, Bât, Blaise Pascal, 20, avenue Albert Einstein - 69621 Villeurbanne Cedex, France. zhen.lin@insa-lyon.fr.

ABSTRACT
In this letter, isolated Si nanocrystal has been formed by dewetting process with a thin silicon dioxide layer on top. Scanning capacitance microscopy and spectroscopy were used to study the memory properties and charge effect in the Si nanocrystal in ambient temperature. The retention time of trapped charges injected by different direct current (DC) bias were evaluated and compared. By ramp process, strong hysteresis window was observed. The DC spectra curve shift direction and distance was observed differently for quantitative measurements. Holes or electrons can be separately injected into these Si-ncs and the capacitance changes caused by these trapped charges can be easily detected by scanning capacitance microscopy/spectroscopy at the nanometer scale. This study is very useful for nanocrystal charge trap memory application.

No MeSH data available.


Related in: MedlinePlus

Ramp process for hysteresis window by SCS.
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Figure 6: Ramp process for hysteresis window by SCS.

Mentions: Ramp processes between -2 and +2 V were done by SCS separately on and outside an isolated Si-nc without charge injection. Strong hysteresis window was observed on the isolated Si-nc. But outside the dot, this effect was too weak (see in Figure 6). Furthermore, SCS was used to quantitatively investigate trapped charge effect inside the isolated Si-nc. From the SCS signals, the curve shift direction and distance were observed differently by applying a DC bias of -10 or +10 V to the tip during charging (see in Figure 7). There is a shift of 0.91 V by +10-V charge while -0.74 V shift by -10-V charge. This relates to the fact that different type of carriers can be injected into these Si-ncs and the capacitance changes caused by these trapped charges can be easily detected by SCM at the nanometer scale. It also verified the previous conclusion that holes are much easier to be injected and trapped than electrons.


Memory properties and charge effect study in Si nanocrystals by scanning capacitance microscopy and spectroscopy.

Lin Z, Bremond G, Bassani F - Nanoscale Res Lett (2011)

Ramp process for hysteresis window by SCS.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3211215&req=5

Figure 6: Ramp process for hysteresis window by SCS.
Mentions: Ramp processes between -2 and +2 V were done by SCS separately on and outside an isolated Si-nc without charge injection. Strong hysteresis window was observed on the isolated Si-nc. But outside the dot, this effect was too weak (see in Figure 6). Furthermore, SCS was used to quantitatively investigate trapped charge effect inside the isolated Si-nc. From the SCS signals, the curve shift direction and distance were observed differently by applying a DC bias of -10 or +10 V to the tip during charging (see in Figure 7). There is a shift of 0.91 V by +10-V charge while -0.74 V shift by -10-V charge. This relates to the fact that different type of carriers can be injected into these Si-ncs and the capacitance changes caused by these trapped charges can be easily detected by SCM at the nanometer scale. It also verified the previous conclusion that holes are much easier to be injected and trapped than electrons.

Bottom Line: Scanning capacitance microscopy and spectroscopy were used to study the memory properties and charge effect in the Si nanocrystal in ambient temperature.The DC spectra curve shift direction and distance was observed differently for quantitative measurements.Holes or electrons can be separately injected into these Si-ncs and the capacitance changes caused by these trapped charges can be easily detected by scanning capacitance microscopy/spectroscopy at the nanometer scale.

View Article: PubMed Central - HTML - PubMed

Affiliation: Institut des Nanotechnologies de Lyon, UMR 5270, Institut National des Sciences Appliquées de Lyon, Université de Lyon, Bât, Blaise Pascal, 20, avenue Albert Einstein - 69621 Villeurbanne Cedex, France. zhen.lin@insa-lyon.fr.

ABSTRACT
In this letter, isolated Si nanocrystal has been formed by dewetting process with a thin silicon dioxide layer on top. Scanning capacitance microscopy and spectroscopy were used to study the memory properties and charge effect in the Si nanocrystal in ambient temperature. The retention time of trapped charges injected by different direct current (DC) bias were evaluated and compared. By ramp process, strong hysteresis window was observed. The DC spectra curve shift direction and distance was observed differently for quantitative measurements. Holes or electrons can be separately injected into these Si-ncs and the capacitance changes caused by these trapped charges can be easily detected by scanning capacitance microscopy/spectroscopy at the nanometer scale. This study is very useful for nanocrystal charge trap memory application.

No MeSH data available.


Related in: MedlinePlus