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Fabrication of ordered nanoporous anodic alumina prepatterned by mold-assisted chemical etching.

Lai KL, Hon MH, Leu IC - Nanoscale Res Lett (2011)

Bottom Line: In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated.During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits.The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

View Article: PubMed Central - HTML - PubMed

Affiliation: Department of Materials Science, National University of Tainan, Tainan 700, Taiwan. icleu@mail.mse.ncku.edu.tw.

ABSTRACT
In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated. This report shows the reaction-diffusion method which formed nanoscale shallow etch pits by the absorption/liberation behaviors of chemical etchant in poly(dimethylsiloxane) stamp. During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits. The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

No MeSH data available.


Related in: MedlinePlus

AFM and SEM images of Al prepattern and AAO (a) 2D Al prepatten after RD-WETS. (b, c) 2D prepattern-induced regular AAO array. Anodization conducted in 0.3 M H3PO4 at 110 V and 5°C.
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Figure 4: AFM and SEM images of Al prepattern and AAO (a) 2D Al prepatten after RD-WETS. (b, c) 2D prepattern-induced regular AAO array. Anodization conducted in 0.3 M H3PO4 at 110 V and 5°C.

Mentions: Furthermore, the 2D periodic prepattern on Al was fabricated using a PDMS mold with square dot arrays, as Figure 4a shows. Shallow etched pits in the prepattern (approximately 40-nm depth) serves as nucleation sites for the development of a pore in the early stage of anodization [5-7], and results in the eventual growth of a pore channel. The results shown in Figure 4b confirm that the predetermined pattern can act as initiation points and guide the growth of channels in the oxide film. Straight oxide nanochannels (Figure 4c) with uniform-sized pores are obtained.


Fabrication of ordered nanoporous anodic alumina prepatterned by mold-assisted chemical etching.

Lai KL, Hon MH, Leu IC - Nanoscale Res Lett (2011)

AFM and SEM images of Al prepattern and AAO (a) 2D Al prepatten after RD-WETS. (b, c) 2D prepattern-induced regular AAO array. Anodization conducted in 0.3 M H3PO4 at 110 V and 5°C.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3211208&req=5

Figure 4: AFM and SEM images of Al prepattern and AAO (a) 2D Al prepatten after RD-WETS. (b, c) 2D prepattern-induced regular AAO array. Anodization conducted in 0.3 M H3PO4 at 110 V and 5°C.
Mentions: Furthermore, the 2D periodic prepattern on Al was fabricated using a PDMS mold with square dot arrays, as Figure 4a shows. Shallow etched pits in the prepattern (approximately 40-nm depth) serves as nucleation sites for the development of a pore in the early stage of anodization [5-7], and results in the eventual growth of a pore channel. The results shown in Figure 4b confirm that the predetermined pattern can act as initiation points and guide the growth of channels in the oxide film. Straight oxide nanochannels (Figure 4c) with uniform-sized pores are obtained.

Bottom Line: In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated.During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits.The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

View Article: PubMed Central - HTML - PubMed

Affiliation: Department of Materials Science, National University of Tainan, Tainan 700, Taiwan. icleu@mail.mse.ncku.edu.tw.

ABSTRACT
In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated. This report shows the reaction-diffusion method which formed nanoscale shallow etch pits by the absorption/liberation behaviors of chemical etchant in poly(dimethylsiloxane) stamp. During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits. The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

No MeSH data available.


Related in: MedlinePlus