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Fabrication of ordered nanoporous anodic alumina prepatterned by mold-assisted chemical etching.

Lai KL, Hon MH, Leu IC - Nanoscale Res Lett (2011)

Bottom Line: In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated.During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits.The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

View Article: PubMed Central - HTML - PubMed

Affiliation: Department of Materials Science, National University of Tainan, Tainan 700, Taiwan. icleu@mail.mse.ncku.edu.tw.

ABSTRACT
In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated. This report shows the reaction-diffusion method which formed nanoscale shallow etch pits by the absorption/liberation behaviors of chemical etchant in poly(dimethylsiloxane) stamp. During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits. The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

No MeSH data available.


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SEM micrographs of anodization sample (a) alumina pores obtained from aluminum foils. (b) alumina pores grown in the 1D grating-patterned area. (c) alumina pores grown in the unpatterned area. Anodization conducted in 0.3 M H3PO4 at 110 V and 5°C.
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Figure 3: SEM micrographs of anodization sample (a) alumina pores obtained from aluminum foils. (b) alumina pores grown in the 1D grating-patterned area. (c) alumina pores grown in the unpatterned area. Anodization conducted in 0.3 M H3PO4 at 110 V and 5°C.

Mentions: After the RD process, anodization was conducted under a constant voltage of 110 V in 0.3 M H3PO4 at 5°C. The anodization voltage for the prepatterned aluminum substrate was chosen to satisfy the linear relationship between the interpore distance and the anodization potential (2.5 nm/V-1) reported for the common anodization process [22]. Figure 3 shows SEM micrographs of alumina pores obtained from aluminum foils, half of which (left-hand side) were obtained on Al pretextured by RD-WETS. Pores arranged in a 1D grating configuration were observed only in the pretextured area, while the disordered pores were found in the untreated area. In addition, it was found that the PDMS stamp can well tolerate the dilute acid etchant, which implies that the soft stamp can be reused multiple times without noticeable decrease in patterning quality [18].


Fabrication of ordered nanoporous anodic alumina prepatterned by mold-assisted chemical etching.

Lai KL, Hon MH, Leu IC - Nanoscale Res Lett (2011)

SEM micrographs of anodization sample (a) alumina pores obtained from aluminum foils. (b) alumina pores grown in the 1D grating-patterned area. (c) alumina pores grown in the unpatterned area. Anodization conducted in 0.3 M H3PO4 at 110 V and 5°C.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3211208&req=5

Figure 3: SEM micrographs of anodization sample (a) alumina pores obtained from aluminum foils. (b) alumina pores grown in the 1D grating-patterned area. (c) alumina pores grown in the unpatterned area. Anodization conducted in 0.3 M H3PO4 at 110 V and 5°C.
Mentions: After the RD process, anodization was conducted under a constant voltage of 110 V in 0.3 M H3PO4 at 5°C. The anodization voltage for the prepatterned aluminum substrate was chosen to satisfy the linear relationship between the interpore distance and the anodization potential (2.5 nm/V-1) reported for the common anodization process [22]. Figure 3 shows SEM micrographs of alumina pores obtained from aluminum foils, half of which (left-hand side) were obtained on Al pretextured by RD-WETS. Pores arranged in a 1D grating configuration were observed only in the pretextured area, while the disordered pores were found in the untreated area. In addition, it was found that the PDMS stamp can well tolerate the dilute acid etchant, which implies that the soft stamp can be reused multiple times without noticeable decrease in patterning quality [18].

Bottom Line: In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated.During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits.The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

View Article: PubMed Central - HTML - PubMed

Affiliation: Department of Materials Science, National University of Tainan, Tainan 700, Taiwan. icleu@mail.mse.ncku.edu.tw.

ABSTRACT
In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated. This report shows the reaction-diffusion method which formed nanoscale shallow etch pits by the absorption/liberation behaviors of chemical etchant in poly(dimethylsiloxane) stamp. During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits. The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

No MeSH data available.


Related in: MedlinePlus