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Fabrication of ordered nanoporous anodic alumina prepatterned by mold-assisted chemical etching.

Lai KL, Hon MH, Leu IC - Nanoscale Res Lett (2011)

Bottom Line: In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated.During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits.The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

View Article: PubMed Central - HTML - PubMed

Affiliation: Department of Materials Science, National University of Tainan, Tainan 700, Taiwan. icleu@mail.mse.ncku.edu.tw.

ABSTRACT
In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated. This report shows the reaction-diffusion method which formed nanoscale shallow etch pits by the absorption/liberation behaviors of chemical etchant in poly(dimethylsiloxane) stamp. During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits. The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

No MeSH data available.


Related in: MedlinePlus

The photograph and AFM images of the aluminum substrate with grating prepatterns (a) sample after RD-WETS. (b) procedure with pitch of 555 nm; (c) 277 nm.
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Figure 2: The photograph and AFM images of the aluminum substrate with grating prepatterns (a) sample after RD-WETS. (b) procedure with pitch of 555 nm; (c) 277 nm.

Mentions: The photograph of sample after RD-WETS is shown in Figure 2a, where the Al surface with grating prepattern appears under visible diffractive light and results in a uniform prepattern over large areas (up to 2 × 2 cm2). A detailed investigation of the film topography was performed by AFM as Figure 2b,c shows. The pitches of grating patterns are 555 and 277 nm with pattern heights of 40 and 25 nm, respectively. Overall, the reaction-diffusion process allowed the PDMS to cut into the Al substrate, in particular, with retention of the stamp's topography.


Fabrication of ordered nanoporous anodic alumina prepatterned by mold-assisted chemical etching.

Lai KL, Hon MH, Leu IC - Nanoscale Res Lett (2011)

The photograph and AFM images of the aluminum substrate with grating prepatterns (a) sample after RD-WETS. (b) procedure with pitch of 555 nm; (c) 277 nm.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3211208&req=5

Figure 2: The photograph and AFM images of the aluminum substrate with grating prepatterns (a) sample after RD-WETS. (b) procedure with pitch of 555 nm; (c) 277 nm.
Mentions: The photograph of sample after RD-WETS is shown in Figure 2a, where the Al surface with grating prepattern appears under visible diffractive light and results in a uniform prepattern over large areas (up to 2 × 2 cm2). A detailed investigation of the film topography was performed by AFM as Figure 2b,c shows. The pitches of grating patterns are 555 and 277 nm with pattern heights of 40 and 25 nm, respectively. Overall, the reaction-diffusion process allowed the PDMS to cut into the Al substrate, in particular, with retention of the stamp's topography.

Bottom Line: In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated.During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits.The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

View Article: PubMed Central - HTML - PubMed

Affiliation: Department of Materials Science, National University of Tainan, Tainan 700, Taiwan. icleu@mail.mse.ncku.edu.tw.

ABSTRACT
In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated. This report shows the reaction-diffusion method which formed nanoscale shallow etch pits by the absorption/liberation behaviors of chemical etchant in poly(dimethylsiloxane) stamp. During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits. The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

No MeSH data available.


Related in: MedlinePlus