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Fabrication of ordered nanoporous anodic alumina prepatterned by mold-assisted chemical etching.

Lai KL, Hon MH, Leu IC - Nanoscale Res Lett (2011)

Bottom Line: In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated.During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits.The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

View Article: PubMed Central - HTML - PubMed

Affiliation: Department of Materials Science, National University of Tainan, Tainan 700, Taiwan. icleu@mail.mse.ncku.edu.tw.

ABSTRACT
In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated. This report shows the reaction-diffusion method which formed nanoscale shallow etch pits by the absorption/liberation behaviors of chemical etchant in poly(dimethylsiloxane) stamp. During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits. The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

No MeSH data available.


Related in: MedlinePlus

Scheme of the experimental procedures for reaction-diffusion wet etching.
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Figure 1: Scheme of the experimental procedures for reaction-diffusion wet etching.

Mentions: The RD-WETS approach can be extended to structuring hard materials by chemical etching reaction. Regardless of the substrate type, the mechanism of localized microetching relied on the diffusive transport of chemicals within a stamp [18-20]. Figure 1 shows the scheme of mold-assisted microetching of substrate. The PDMS stamp was soaked in etching solution (2% mixed acid in alcohol) for 10 min and absorbed approximately 4% etching solution, and the residual solution on the surface of stamp was removed by N2 flow. Then, the wet stamp was set on Al substrate with a slight loading (0.01 MPa) to ensure a conformal contact with substrate. The etchant-contained alcohol liberated from stamp reacted with Al metal, and the reaction products diffused into PDMS along the concentration gradient as the arrows indicated. Compared with the conventional RD-WETS process, this method used alcohol in place of water because the alcohol in agarose mold has a higher absorptivity than water [21]. It helps to adjust the degree of reaction-diffusion by the solvent liberation/absorption process and this two-way chemical "pump" increases the work efficiency. From this point of view, the parameters of RD process should be adjusted to meet the requirements of imprinting nanopatterns on Al surface. In general, the shallow nanoscale concave (just 3 nm in depth is sufficient) can guide the ordered growth of AAO effectively [9].


Fabrication of ordered nanoporous anodic alumina prepatterned by mold-assisted chemical etching.

Lai KL, Hon MH, Leu IC - Nanoscale Res Lett (2011)

Scheme of the experimental procedures for reaction-diffusion wet etching.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3211208&req=5

Figure 1: Scheme of the experimental procedures for reaction-diffusion wet etching.
Mentions: The RD-WETS approach can be extended to structuring hard materials by chemical etching reaction. Regardless of the substrate type, the mechanism of localized microetching relied on the diffusive transport of chemicals within a stamp [18-20]. Figure 1 shows the scheme of mold-assisted microetching of substrate. The PDMS stamp was soaked in etching solution (2% mixed acid in alcohol) for 10 min and absorbed approximately 4% etching solution, and the residual solution on the surface of stamp was removed by N2 flow. Then, the wet stamp was set on Al substrate with a slight loading (0.01 MPa) to ensure a conformal contact with substrate. The etchant-contained alcohol liberated from stamp reacted with Al metal, and the reaction products diffused into PDMS along the concentration gradient as the arrows indicated. Compared with the conventional RD-WETS process, this method used alcohol in place of water because the alcohol in agarose mold has a higher absorptivity than water [21]. It helps to adjust the degree of reaction-diffusion by the solvent liberation/absorption process and this two-way chemical "pump" increases the work efficiency. From this point of view, the parameters of RD process should be adjusted to meet the requirements of imprinting nanopatterns on Al surface. In general, the shallow nanoscale concave (just 3 nm in depth is sufficient) can guide the ordered growth of AAO effectively [9].

Bottom Line: In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated.During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits.The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

View Article: PubMed Central - HTML - PubMed

Affiliation: Department of Materials Science, National University of Tainan, Tainan 700, Taiwan. icleu@mail.mse.ncku.edu.tw.

ABSTRACT
In this article, a simple and cost-effective method to create patterned nanoindentations on Al surface via mold-assisted chemical etching process is demonstrated. This report shows the reaction-diffusion method which formed nanoscale shallow etch pits by the absorption/liberation behaviors of chemical etchant in poly(dimethylsiloxane) stamp. During subsequent anodization, it was possible to obtain the ordered nanopore arrays with 277 nm pitch that were guided by the prepatterned etch pits. The prepatterned etch pits obtained can guide the growth of AAO nanopores during anodization and facilitate the preparation of ordered nanopore arrays.

No MeSH data available.


Related in: MedlinePlus