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GaInNAs-based Hellish-vertical cavity semiconductor optical amplifier for 1.3 μm operation.

Chaqmaqchee FA, Mazzucato S, Oduncuoglu M, Balkan N, Sun Y, Gunes M, Hugues M, Hopkinson M - Nanoscale Res Lett (2011)

Bottom Line: It was characterised through I-V, L-V and by spectral photoluminescence, electroluminescence and electro-photoluminescence as a function of temperature and applied bias.Cavity resonance and gain peak curves have been calculated at different temperatures.Good agreement between experimental and theoretical results has been obtained.

View Article: PubMed Central - HTML - PubMed

Affiliation: School of Computer Science and Electronic Engineering, University of Essex, Colchester CO4 3SQ, UK. faicha@essex.ac.uk.

ABSTRACT
Hot electron light emission and lasing in semiconductor heterostructure (Hellish) devices are surface emitters the operation of which is based on the longitudinal injection of electrons and holes in the active region. These devices can be designed to be used as vertical cavity surface emitting laser or, as in this study, as a vertical cavity semiconductor optical amplifier (VCSOA). This study investigates the prospects for a Hellish VCSOA based on GaInNAs/GaAs material for operation in the 1.3-μm wavelength range. Hellish VCSOAs have increased functionality, and use undoped distributed Bragg reflectors; and this coupled with direct injection into the active region is expected to yield improvements in the gain and bandwidth. The design of the Hellish VCSOA is based on the transfer matrix method and the optical field distribution within the structure, where the determination of the position of quantum wells is crucial. A full assessment of Hellish VCSOAs has been performed in a device with eleven layers of Ga0.35In0.65N0.02As0.08/GaAs quantum wells (QWs) in the active region. It was characterised through I-V, L-V and by spectral photoluminescence, electroluminescence and electro-photoluminescence as a function of temperature and applied bias. Cavity resonance and gain peak curves have been calculated at different temperatures. Good agreement between experimental and theoretical results has been obtained.

No MeSH data available.


Related in: MedlinePlus

Integrated EL intensity versus applied electric field at various temperatures.
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Figure 5: Integrated EL intensity versus applied electric field at various temperatures.

Mentions: Figure 5 shows the integrated emission light from the device as a function of applied electric field. The threshold light emission varies between 110 and 290 V/cm according to the sample temperature. Above the threshold, the integrated EL increases linearly with applied electric field.


GaInNAs-based Hellish-vertical cavity semiconductor optical amplifier for 1.3 μm operation.

Chaqmaqchee FA, Mazzucato S, Oduncuoglu M, Balkan N, Sun Y, Gunes M, Hugues M, Hopkinson M - Nanoscale Res Lett (2011)

Integrated EL intensity versus applied electric field at various temperatures.
© Copyright Policy - open-access
Related In: Results  -  Collection

License
Show All Figures
getmorefigures.php?uid=PMC3211148&req=5

Figure 5: Integrated EL intensity versus applied electric field at various temperatures.
Mentions: Figure 5 shows the integrated emission light from the device as a function of applied electric field. The threshold light emission varies between 110 and 290 V/cm according to the sample temperature. Above the threshold, the integrated EL increases linearly with applied electric field.

Bottom Line: It was characterised through I-V, L-V and by spectral photoluminescence, electroluminescence and electro-photoluminescence as a function of temperature and applied bias.Cavity resonance and gain peak curves have been calculated at different temperatures.Good agreement between experimental and theoretical results has been obtained.

View Article: PubMed Central - HTML - PubMed

Affiliation: School of Computer Science and Electronic Engineering, University of Essex, Colchester CO4 3SQ, UK. faicha@essex.ac.uk.

ABSTRACT
Hot electron light emission and lasing in semiconductor heterostructure (Hellish) devices are surface emitters the operation of which is based on the longitudinal injection of electrons and holes in the active region. These devices can be designed to be used as vertical cavity surface emitting laser or, as in this study, as a vertical cavity semiconductor optical amplifier (VCSOA). This study investigates the prospects for a Hellish VCSOA based on GaInNAs/GaAs material for operation in the 1.3-μm wavelength range. Hellish VCSOAs have increased functionality, and use undoped distributed Bragg reflectors; and this coupled with direct injection into the active region is expected to yield improvements in the gain and bandwidth. The design of the Hellish VCSOA is based on the transfer matrix method and the optical field distribution within the structure, where the determination of the position of quantum wells is crucial. A full assessment of Hellish VCSOAs has been performed in a device with eleven layers of Ga0.35In0.65N0.02As0.08/GaAs quantum wells (QWs) in the active region. It was characterised through I-V, L-V and by spectral photoluminescence, electroluminescence and electro-photoluminescence as a function of temperature and applied bias. Cavity resonance and gain peak curves have been calculated at different temperatures. Good agreement between experimental and theoretical results has been obtained.

No MeSH data available.


Related in: MedlinePlus